VUV laser-induced plasma emissions for ultra-micro spectrochemical analysis of liquid samples

Nai Ho Cheung*, C. W. Ng, W. F. Ho, Edward S. Yeung

*Corresponding author for this work

Research output: Contribution to journalConference articlepeer-review

Abstract

The specific case of pulsed-laser ablation of liquid samples were studied and the production mechanism of the plasma emissions aimed to reduce their interfering effects. Aqueous solutions seeded with various metal salts as test analysis were ablated with laser pulses of 532-nm, 248-nm, and 193-nm wavelengths. Time and space resolved spectra of the plume emissions were analyzed to yield estimates of plasma temperature and electron density. With 532-nm ablation, the plasma produced was hot and extensively ionized, with electron density in the 1018 cm-3 range. 193-nm laser ablation at similar fluence generated plasmas of much lower temperature but comparable electron density.

Original languageEnglish
Pages (from-to)185-186
Number of pages2
JournalConference Proceedings - Lasers and Electro-Optics Society Annual Meeting-LEOS
Volume11
Publication statusPublished - 1997
EventProceedings of the 1997 Conference on Lasers and Electro-Optics, CLEO - Baltimore, MD, USA
Duration: 18 May 199723 May 1997

Scopus Subject Areas

  • Electronic, Optical and Magnetic Materials
  • Electrical and Electronic Engineering

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