Triple patterning aware detailed placement with constrained pattern assignment

Haitong Tian, Yuelin Du, Hongbo Zhang, Zigang Xiao, Martin D.F. Wong

Research output: Chapter in book/report/conference proceedingConference proceedingpeer-review

Abstract

Triple patterning lithography (TPL) has been recognized as one of the most promising techniques for 14/10nm technology node. There are various concerns for TPL decompositions. For standard cell based designs, assigning the same pattern for the same type of cells is a desired property for TPL decomposition. It is more robust for process variations and gives the chip similar physical and electrical characteristics as well as more reliable and predictable performance. Assigning the same type of pattern for the same type of cell is called a constrained pattern assignment (CPA) problem. In this paper, we integrated the flow of detailed placement and TPL decompositions with CPA coloring constraints. We focused on refining a layout to make it CPA-friendly during the detailed placement stage while minimizing the area and HPWL (half perimeter wire length) overhead. A weighted partial MAX SAT approach is proposed which guarantees to obtain a CPA-friendly detailed placement result while minimizing the area overhead. An efficient graph model is also proposed to compute the locations of the cells with optimal HPWL. Our formulation is very efficient and achieves a 79.4% area overhead reduction compared with the approach of fixing cell colors beforehand. Better HPWL are also achieved consistently over all benchmarks.
Original languageEnglish
Title of host publication2014 IEEE/ACM International Conference on Computer-Aided Design (ICCAD)
PublisherIEEE
Pages116-123
Number of pages8
ISBN (Electronic)9781479962785
DOIs
Publication statusPublished - Nov 2014
Event2014 IEEE/ACM International Conference on Computer-Aided Design, ICCAD 2014 - San Jose, United States
Duration: 2 Nov 20146 Nov 2014

Publication series

NameProceedings of IEEE/ACM International Conference on Computer-Aided Design (ICCAD)

Conference

Conference2014 IEEE/ACM International Conference on Computer-Aided Design, ICCAD 2014
Country/TerritoryUnited States
CitySan Jose
Period2/11/146/11/14

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