Abstract
Energy-loss spectroscopy (ELS) has been used to study the initial adsorption of oxygen on the Si(111)7 × 7 surface at 150 K. Experimental results show that at low exposure of 0.25 L oxygen begins to adsorb on the Si(111)7 × 7 surface. No saturated adsorption can be observed until 5 L. The possible surface transitions from intrinsic surface states on the clean surface and from oxygen-induced surface states on the adsorbed surface are presented.
| Original language | English |
|---|---|
| Pages (from-to) | 293-297 |
| Number of pages | 5 |
| Journal | Applied Surface Science |
| Volume | 78 |
| Issue number | 3 |
| DOIs | |
| Publication status | Published - Jul 1994 |
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