The initial adsorption of oxygen on the Si(111)7 × 7 surface at 150 K

  • Daoxuan Dai*
  • , Furong Zhu
  • , Yansheng Luo
  • , I. Davoli
  • , S. Stizza
  • *Corresponding author for this work

Research output: Contribution to journalJournal articlepeer-review

4 Citations (Scopus)

Abstract

Energy-loss spectroscopy (ELS) has been used to study the initial adsorption of oxygen on the Si(111)7 × 7 surface at 150 K. Experimental results show that at low exposure of 0.25 L oxygen begins to adsorb on the Si(111)7 × 7 surface. No saturated adsorption can be observed until 5 L. The possible surface transitions from intrinsic surface states on the clean surface and from oxygen-induced surface states on the adsorbed surface are presented.

Original languageEnglish
Pages (from-to)293-297
Number of pages5
JournalApplied Surface Science
Volume78
Issue number3
DOIs
Publication statusPublished - Jul 1994

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