The influence of the implantation dose and energy on the electroluminescence of Si+-implanted amorphous SiO2 thin films

L. Ding*, T. P. Chen, Y. Liu*, M. Yang, J. I. Wong, K. Y. Liu, Furong Zhu, S. Fung

*Corresponding author for this work

Research output: Contribution to journal › Article › peer-review

20 Citations (Scopus)

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Engineering & Materials Science

Chemical Compounds