TY - GEN
T1 - Sub-wavelength imaging from multilayer superlens
AU - LI, Guixin
AU - Li, Jensen
AU - TAM, Hoi Lam
AU - Chan, Che Ting
AU - CHEAH, Kok Wai
PY - 2010
Y1 - 2010
N2 - Multilayer superlens has been reported that it had advantages over the original single slab superlens [1]. In this work, single silver layer and Ag-SiO2 multilayer superlens devices working at wavelength of 365 nm were fabricated using standard photolithography method. Grating object with sub-wavelength resolution could be resolved through both kinds of superlens with working distance up to 128nm. However, Ag-SiO2 multilayer superlens shows higher transmittance and image contrasts than the single silver layer one, this result verifies the theoretical results in Ref. [1].
AB - Multilayer superlens has been reported that it had advantages over the original single slab superlens [1]. In this work, single silver layer and Ag-SiO2 multilayer superlens devices working at wavelength of 365 nm were fabricated using standard photolithography method. Grating object with sub-wavelength resolution could be resolved through both kinds of superlens with working distance up to 128nm. However, Ag-SiO2 multilayer superlens shows higher transmittance and image contrasts than the single silver layer one, this result verifies the theoretical results in Ref. [1].
UR - http://www.scopus.com/inward/record.url?scp=77951654268&partnerID=8YFLogxK
U2 - 10.1109/INEC.2010.5424886
DO - 10.1109/INEC.2010.5424886
M3 - Conference proceeding
AN - SCOPUS:77951654268
SN - 9781424435449
T3 - INEC 2010 - 2010 3rd International Nanoelectronics Conference, Proceedings
SP - 1309
EP - 1310
BT - INEC 2010 - 2010 3rd International Nanoelectronics Conference, Proceedings
T2 - 2010 3rd International Nanoelectronics Conference, INEC 2010
Y2 - 3 January 2010 through 8 January 2010
ER -