Solution-processed trilayer inorganic dielectric for high performance flexible organic field effect transistors

H. S. Tan, S. R. Kulkarni, T. Cahyadi, P. S. Lee, S. G. Mhaisalkar*, J. Kasim, Z. X. Shen, Furong Zhu

*Corresponding author for this work

Research output: Contribution to journalJournal articlepeer-review

19 Citations (Scopus)

Abstract

High performance organic field effect transistors using a solution-processable processed trilayer sol-gel silica gate dielectric architecture fabricated on plastic substrates exhibited low driving voltages of -3.0 V, high saturation mobilities of ∼3.5 cm2 V s, and on-off current ratio of 105. The enhancement in field effect mobility is attributed to improved dielectric-semiconductor interfacial morphology and increased capacitance of the tristratal dielectric. The pentacene devices displayed no signs of electrical degradation upon bending through a bending radius of 24 mm, 2.27% strain. The slight increase in the drain currents upon bending strain was investigated using Raman spectroscopy, which revealed enhanced in-phase intermolecular coupling.

Original languageEnglish
Article number183503
Number of pages3
JournalApplied Physics Letters
Volume93
Issue number18
DOIs
Publication statusPublished - 3 Nov 2008

Scopus Subject Areas

  • Physics and Astronomy (miscellaneous)

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