Abstract
Self-aligned double patterning (SADP) lithography is a promising technology which can reduce the overlay and print 2D features for sub-32nm process. Yet, how to decompose a layout to minimize the overlay and perform hot spot detection is still an open problem. In this paper, we present an algorithm that can optimally solve the SADP decomposition problem. For a decomposable layout, our algorithm guarantees to find a decomposition solution that minimizes overlay. For a non-decomposable layout our algorithm guarantees to find all hot spots. Experimental results validate our method, and decomposition results for Nangate Open Cell Library and larger testcases are also provided with competitive run-times.
Original language | English |
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Title of host publication | 48th ACM/IEEE Design Automation Conference - Proceedings 2011 |
Publisher | Association for Computing Machinery (ACM) |
Pages | 71-76 |
Number of pages | 6 |
ISBN (Print) | 9781450306362 |
DOIs | |
Publication status | Published - 7 Jun 2011 |
Event | 48th ACM/IEEE Design Automation Conference, DAC 2011 - San Diego, United States Duration: 5 Jun 2011 → 9 Jun 2011 https://www.dac.com/About/Conference-Archive/48th-DAC-2011 (Conference website) https://www.dac.com/portals/0/documents/archive/2011/48DAC_Final_Program_front.pdf (Conference programme) https://dl.acm.org/doi/proceedings/10.1145/2024724 (Conference proceedings) https://ieeexplore.ieee.org/xpl/conhome/5968673/proceeding (Conference proceedings) |
Publication series
Name | ACM/IEEE Design Automation Conference - Proceedings |
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ISSN (Print) | 0738-100X |
Conference
Conference | 48th ACM/IEEE Design Automation Conference, DAC 2011 |
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Country/Territory | United States |
City | San Diego |
Period | 5/06/11 → 9/06/11 |
Internet address |
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Scopus Subject Areas
- Computer Science Applications
- Control and Systems Engineering
- Electrical and Electronic Engineering
- Modelling and Simulation
User-Defined Keywords
- SADP
- 2D decomposition
- overlay minimization
- hot-spot detection
- ILP