Self-aligned double patterning decomposition for overlay minimization and hot spot detection

Hongbo Zhang, Yuelin Du, Martin D. F. Wong, Rasit Topaloglu

Research output: Chapter in book/report/conference proceedingConference proceedingpeer-review

40 Citations (Scopus)


Self-aligned double patterning (SADP) lithography is a promising technology which can reduce the overlay and print 2D features for sub-32nm process. Yet, how to decompose a layout to minimize the overlay and perform hot spot detection is still an open problem. In this paper, we present an algorithm that can optimally solve the SADP decomposition problem. For a decomposable layout, our algorithm guarantees to find a decomposition solution that minimizes overlay. For a non-decomposable layout our algorithm guarantees to find all hot spots. Experimental results validate our method, and decomposition results for Nangate Open Cell Library and larger testcases are also provided with competitive run-times.

Original languageEnglish
Title of host publication48th ACM/IEEE Design Automation Conference - Proceedings 2011
PublisherAssociation for Computing Machinery (ACM)
Number of pages6
ISBN (Print)9781450306362
Publication statusPublished - 7 Jun 2011
Event48th ACM/IEEE Design Automation Conference, DAC 2011 - San Diego, United States
Duration: 5 Jun 20119 Jun 2011 (Conference website) (Conference programme) (Conference proceedings) (Conference proceedings)

Publication series

NameACM/IEEE Design Automation Conference - Proceedings
ISSN (Print)0738-100X


Conference48th ACM/IEEE Design Automation Conference, DAC 2011
Country/TerritoryUnited States
CitySan Diego
Internet address

Scopus Subject Areas

  • Computer Science Applications
  • Control and Systems Engineering
  • Electrical and Electronic Engineering
  • Modelling and Simulation

User-Defined Keywords

  • SADP
  • 2D decomposition
  • overlay minimization
  • hot-spot detection
  • ILP


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