Self-aligned double patterning decomposition for overlay minimization and hot spot detection

Hongbo Zhang; Yuelin Du; Martin D. F. Wong; Rasit Topaloglu

doi:10.1145/2024724.2024741

Self-aligned double patterning decomposition for overlay minimization and hot spot detection

Hongbo Zhang, Yuelin Du, Martin D. F. Wong, Rasit Topaloglu

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Research output: Chapter in book/report/conference proceeding › Conference proceeding › peer-review

40 Citations (Scopus)

Abstract

Self-aligned double patterning (SADP) lithography is a promising technology which can reduce the overlay and print 2D features for sub-32nm process. Yet, how to decompose a layout to minimize the overlay and perform hot spot detection is still an open problem. In this paper, we present an algorithm that can optimally solve the SADP decomposition problem. For a decomposable layout, our algorithm guarantees to find a decomposition solution that minimizes overlay. For a non-decomposable layout our algorithm guarantees to find all hot spots. Experimental results validate our method, and decomposition results for Nangate Open Cell Library and larger testcases are also provided with competitive run-times.

Original language	English
Title of host publication	48th ACM/IEEE Design Automation Conference - Proceedings 2011
Publisher	Association for Computing Machinery (ACM)
Pages	71-76
Number of pages	6
ISBN (Print)	9781450306362
DOIs	https://doi.org/10.1145/2024724.2024741
Publication status	Published - 7 Jun 2011
Event	48th ACM/IEEE Design Automation Conference, DAC 2011 - San Diego, United States Duration: 5 Jun 2011 → 9 Jun 2011 https://www.dac.com/About/Conference-Archive/48th-DAC-2011 (Conference website) https://www.dac.com/portals/0/documents/archive/2011/48DAC_Final_Program_front.pdf (Conference programme) https://dl.acm.org/doi/proceedings/10.1145/2024724 (Conference proceedings) https://ieeexplore.ieee.org/xpl/conhome/5968673/proceeding (Conference proceedings)

Publication series

Name	ACM/IEEE Design Automation Conference - Proceedings
ISSN (Print)	0738-100X

Conference

Conference	48th ACM/IEEE Design Automation Conference, DAC 2011
Country/Territory	United States
City	San Diego
Period	5/06/11 → 9/06/11
Internet address	https://www.dac.com/About/Conference-Archive/48th-DAC-2011 (Conference website) https://www.dac.com/portals/0/documents/archive/2011/48DAC_Final_Program_front.pdf (Conference programme) https://dl.acm.org/doi/proceedings/10.1145/2024724 (Conference proceedings) https://ieeexplore.ieee.org/xpl/conhome/5968673/proceeding (Conference proceedings)

Scopus Subject Areas

Computer Science Applications
Control and Systems Engineering
Electrical and Electronic Engineering
Modelling and Simulation

User-Defined Keywords

SADP
2D decomposition
overlay minimization
hot-spot detection
ILP

Access to Document

10.1145/2024724.2024741

Cite this

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title = "Self-aligned double patterning decomposition for overlay minimization and hot spot detection",

abstract = "Self-aligned double patterning (SADP) lithography is a promising technology which can reduce the overlay and print 2D features for sub-32nm process. Yet, how to decompose a layout to minimize the overlay and perform hot spot detection is still an open problem. In this paper, we present an algorithm that can optimally solve the SADP decomposition problem. For a decomposable layout, our algorithm guarantees to find a decomposition solution that minimizes overlay. For a non-decomposable layout our algorithm guarantees to find all hot spots. Experimental results validate our method, and decomposition results for Nangate Open Cell Library and larger testcases are also provided with competitive run-times.",

keywords = "SADP, 2D decomposition, overlay minimization, hot-spot detection, ILP",

author = "Hongbo Zhang and Yuelin Du and Wong, {Martin D. F.} and Rasit Topaloglu",

note = "Funding information: This work was partially supported by the National Science Foundation under grant CCF-1017516 and a grant from the Semiconductor Research Corporation (SRC).; 48th ACM/IEEE Design Automation Conference, DAC 2011 ; Conference date: 05-06-2011 Through 09-06-2011",

year = "2011",

month = jun,

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doi = "10.1145/2024724.2024741",

language = "English",

isbn = "9781450306362",

series = "ACM/IEEE Design Automation Conference - Proceedings",

publisher = "Association for Computing Machinery (ACM)",

pages = "71--76",

booktitle = "48th ACM/IEEE Design Automation Conference - Proceedings 2011",

address = "United States",

url = "https://www.dac.com/About/Conference-Archive/48th-DAC-2011, https://www.dac.com/portals/0/documents/archive/2011/48DAC_Final_Program_front.pdf, https://dl.acm.org/doi/proceedings/10.1145/2024724, https://ieeexplore.ieee.org/xpl/conhome/5968673/proceeding",

}

Zhang, H, Du, Y, Wong, MDF & Topaloglu, R 2011, Self-aligned double patterning decomposition for overlay minimization and hot spot detection. in 48th ACM/IEEE Design Automation Conference - Proceedings 2011. ACM/IEEE Design Automation Conference - Proceedings, Association for Computing Machinery (ACM), pp. 71-76, 48th ACM/IEEE Design Automation Conference, DAC 2011, San Diego, California, United States, 5/06/11. https://doi.org/10.1145/2024724.2024741

Self-aligned double patterning decomposition for overlay minimization and hot spot detection. / Zhang, Hongbo; Du, Yuelin; Wong, Martin D. F. et al.
48th ACM/IEEE Design Automation Conference - Proceedings 2011. Association for Computing Machinery (ACM), 2011. p. 71-76 (ACM/IEEE Design Automation Conference - Proceedings).

Research output: Chapter in book/report/conference proceeding › Conference proceeding › peer-review

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T1 - Self-aligned double patterning decomposition for overlay minimization and hot spot detection

AU - Zhang, Hongbo

AU - Du, Yuelin

AU - Wong, Martin D. F.

AU - Topaloglu, Rasit

N1 - Funding information: This work was partially supported by the National Science Foundation under grant CCF-1017516 and a grant from the Semiconductor Research Corporation (SRC).

PY - 2011/6/7

Y1 - 2011/6/7

N2 - Self-aligned double patterning (SADP) lithography is a promising technology which can reduce the overlay and print 2D features for sub-32nm process. Yet, how to decompose a layout to minimize the overlay and perform hot spot detection is still an open problem. In this paper, we present an algorithm that can optimally solve the SADP decomposition problem. For a decomposable layout, our algorithm guarantees to find a decomposition solution that minimizes overlay. For a non-decomposable layout our algorithm guarantees to find all hot spots. Experimental results validate our method, and decomposition results for Nangate Open Cell Library and larger testcases are also provided with competitive run-times.

AB - Self-aligned double patterning (SADP) lithography is a promising technology which can reduce the overlay and print 2D features for sub-32nm process. Yet, how to decompose a layout to minimize the overlay and perform hot spot detection is still an open problem. In this paper, we present an algorithm that can optimally solve the SADP decomposition problem. For a decomposable layout, our algorithm guarantees to find a decomposition solution that minimizes overlay. For a non-decomposable layout our algorithm guarantees to find all hot spots. Experimental results validate our method, and decomposition results for Nangate Open Cell Library and larger testcases are also provided with competitive run-times.

KW - SADP

KW - 2D decomposition

KW - overlay minimization

KW - hot-spot detection

KW - ILP

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ER -

Self-aligned double patterning decomposition for overlay minimization and hot spot detection

Abstract

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User-Defined Keywords

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