Abstract
In this brief, room-temperature visible electroluminescence (EL) from aluminum nitride (AlN) thin films containing aluminum nanocrystals (nc-Al) prepared by a radio-frequency magnetron sputtering technique is reported. The EL shows a broad spectrum peaked at 565 nm (2.19 eV) when a negative gate voltage is applied. A linear relationship between the EL and the current transport in the nc-Al/AlN thin film system is observed, and both the current transport and the EL intensity exhibit a power-law dependence on the gate voltage. These results are explained in terms of the formation of percolation networks of tunneling paths by the nc-Al arrays and the radiative recombination of the injected electrons and holes via the deep-level defects at the locations of nc-Al along the tunneling paths.
| Original language | English |
|---|---|
| Pages (from-to) | 3605-3609 |
| Number of pages | 5 |
| Journal | IEEE Transactions on Electron Devices |
| Volume | 55 |
| Issue number | 12 |
| Early online date | 21 Nov 2008 |
| DOIs | |
| Publication status | Published - Dec 2008 |
User-Defined Keywords
- Aluminum nanocrystal
- Aluminum nitride
- Electroluminescence
- Light emitting device