TY - JOUR
T1 - Photodesorption of NO from Ag(111) and Cu(111)
AU - So, S. K.
AU - Franchy, R.
AU - Ho, W.
N1 - Funding information:
Support of this research by the Office of the Naval Research under Grant No. NOOO14-90-J-1214 and the Cornell Materials Science Center through National Science Grant No. DMR-88-18558 is gratefully acknowledged. We would like to thank Bengt Kasemo and Z. Charles Ying for many stimulating discussions, and Thomas A. Germer and Waiter D. Mieher for a critical reading of the manuscript.
Publisher copyright:
© 1991 American Institute of Physics.
PY - 1991/7/15
Y1 - 1991/7/15
N2 - The adsorption, thermal reactions, and photoreactions of NO on Ag (111) and Cu (111) at 80-85 K have been studied by thermal-desorption spectroscopy (TDS), high-resolution electron-energy-loss spectroscopy (HREELS), and photon-induced desorption. Adsorption of NO on both surfaces is quite complicated. At saturation coverage, a number of chemical species are present, including atop and bridge-bonded NO, atomic N and O, and N2O. Photodesorption of NO, N2, and N2O is observed simultaneously under low-power photon irradiation in the wavelength range for 260-600 nm. From TD and HREEL spectra before and after photon irradiation, it is established that on both surfaces the atop NO is photoactive. Photon polarization, power-, and wavelength-dependences studies indicate that the mechanisms for photodesorption are nonthermal. A substrate-mediated mechanism involving photogenerated carriers at low photon energies (<3 eV) and a direct excitation mechanism of the adsorbate-surface complex at high photon energies are used to explain the observed photodesorption.
AB - The adsorption, thermal reactions, and photoreactions of NO on Ag (111) and Cu (111) at 80-85 K have been studied by thermal-desorption spectroscopy (TDS), high-resolution electron-energy-loss spectroscopy (HREELS), and photon-induced desorption. Adsorption of NO on both surfaces is quite complicated. At saturation coverage, a number of chemical species are present, including atop and bridge-bonded NO, atomic N and O, and N2O. Photodesorption of NO, N2, and N2O is observed simultaneously under low-power photon irradiation in the wavelength range for 260-600 nm. From TD and HREEL spectra before and after photon irradiation, it is established that on both surfaces the atop NO is photoactive. Photon polarization, power-, and wavelength-dependences studies indicate that the mechanisms for photodesorption are nonthermal. A substrate-mediated mechanism involving photogenerated carriers at low photon energies (<3 eV) and a direct excitation mechanism of the adsorbate-surface complex at high photon energies are used to explain the observed photodesorption.
UR - http://www.scopus.com/inward/record.url?scp=33645848808&partnerID=8YFLogxK
U2 - 10.1063/1.461120
DO - 10.1063/1.461120
M3 - Journal article
AN - SCOPUS:33645848808
SN - 0021-9606
VL - 95
SP - 1385
EP - 1399
JO - The Journal of Chemical Physics
JF - The Journal of Chemical Physics
IS - 2
ER -