Optical proximity correction (OPC): friendly maze routing

Li Da Huang, Martin D. F. Wong

Research output: Chapter in book/report/conference proceedingConference proceedingpeer-review


As the technology migrates into the deep submicron manufacturing(DSM) era, the critical dimension of the circuits is getting smaller than the lithographic wavelength. The unavoidable light diffraction phenomena in the sub-wavelength technologies have become one of the major factors in the yield rate. Optical proximity correction (OPC) is one of the methods adopted to compensate for the light diffraction effect as a post layout process.However, the process is time-consuming and the results are still limited by the original layout quality. In this paper, we propose a maze routing method that considers the optical effect in the routing algorithm. By utilizing the symmetrical property of the optical system, the light diffraction is efficiently calculated and stored in tables. The costs that guide the router to minimize the optical interferences are obtained from these look-up tables. The problem is first formulated as a constrained maze routing problem, then it is shown to be a multiple constrained shortest path problem. Based on the Lagrangian relaxation method, an effective algorithm is designed to solve the problem.
Original languageEnglish
Title of host publication41st ACM/IEEE Design Automation Conference - Proceedings 2004
Place of PublicationUnited States
PublisherAssociation for Computing Machinery (ACM)
Number of pages6
ISBN (Print)9781581138283, 1511838288
Publication statusPublished - Jun 2004
Event41st ACM/IEEE Design Automation Conference, DAC 2004 - San Diego, United States
Duration: 7 Jun 200411 Jun 2004
https://www.dac.com/portals/0/documents/archive/2005-01/41stfinal.pdf (Conference program)
https://dl.acm.org/doi/proceedings/10.1145/996566 (Conference proceedings)
https://ieeexplore.ieee.org/xpl/conhome/9238/proceeding (Conference proceedings)

Publication series

NameACM/IEEE Design Automation Conference - Proceedings
ISSN (Print)0738-100X


Conference41st ACM/IEEE Design Automation Conference, DAC 2004
Country/TerritoryUnited States
CitySan Diego
Internet address

User-Defined Keywords

  • micro-lithography
  • VLSI
  • maze routing
  • optical system
  • manufacturing
  • OPC


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