Abstract
Semiconductor lithography is a key process for fabricating integrated circuits, but it suffers from various distortions and variations that affect the quality of the printed patterns. Optical proximity correction (OPC) is a technique to improve pattern fidelity and robustness, and inverse lithography technique (ILT) is a promising OPC method that optimizes the mask as an inverse problem of the imaging system. However, ILT is computationally expensive and challenging to implement at a full-chip scale. In this paper, we present OpenILT, an open-source ILT platform that supports the rapid development and evaluation of GPU-accelerated and AI-driven ILT methods. OpenILT provides a modular and flexible framework that integrates various ILT components, such as lithography simulation, objective functions, and evaluation metrics. It also offers a convenient interface to PyTorch, a popular deep learning library, to enable the implementation of GPU-accelerated and AI-driven ILT methods.
Original language | English |
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Title of host publication | Proceedings of 2023 IEEE 15th International Conference on ASIC, ASICON 2023 |
Editors | Fan Ye, Ting-Ao Tang |
Publisher | IEEE |
Number of pages | 4 |
ISBN (Electronic) | 9798350312980 |
ISBN (Print) | 9798350312997 |
DOIs | |
Publication status | Published - Oct 2023 |
Event | 15th IEEE International Conference on ASIC, ASICON 2023 - Nanjing, China Duration: 24 Oct 2023 → 27 Oct 2023 https://ieeexplore.ieee.org/xpl/conhome/10395907/proceeding |
Publication series
Name | Proceedings of International Conference on ASIC |
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ISSN (Print) | 2162-7541 |
ISSN (Electronic) | 2162-755X |
Conference
Conference | 15th IEEE International Conference on ASIC, ASICON 2023 |
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Country/Territory | China |
City | Nanjing |
Period | 24/10/23 → 27/10/23 |
Internet address |
Scopus Subject Areas
- Hardware and Architecture
- Electrical and Electronic Engineering