On mask layout partitioning for electron projection lithography

Ruiqi Tian; Ronggang Yu; Xiaoping Tang; D. F. Wong

doi:10.1145/774572.774648

On mask layout partitioning for electron projection lithography

Ruiqi Tian, Ronggang Yu, Xiaoping Tang, D. F. Wong

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Research output: Chapter in book/report/conference proceeding › Conference proceeding › peer-review

1 Citation (Scopus)

Abstract

Electron projection lithography (EPL) is a leading candidate for next generation lithography (NGL) in VLSI production. The membrane mask used in EPL is divided into sub-fields by struts for structural support. A layout must be partitioned into these sub-fields on mask and then stitched back together by the EPL tool on wafer. To minimize possible stitching errors, partitioning of a mask layout should minimize cuts of layout features in the overlapping area between two adjacent sub-fields. This paper presents the first formulation of the mask layout partitioning problem for EPL as a graph problem. The graph formulation is optimally solved with a shortest path approach. Two other techniques are also presented to speed up computation. Experimental runs on data from a real industry design show excellent results.

Original language	English
Title of host publication	Proceedings of The IEEE/ACM International Conference on Computer-Aided Design, ICCAD 2002
Place of Publication	United States
Publisher	Association for Computing Machinery (ACM)
Pages	514-518
Number of pages	5
ISBN (Print)	9780780376076
DOIs	https://doi.org/10.1145/774572.774648
Publication status	Published - Nov 2002
Event	2002 IEEE/ACM International Conference on Computer-Aided Design, ICCAD 2002 - San Jose, United States Duration: 10 Nov 2002 → 14 Nov 2002 https://dl.acm.org/doi/proceedings/10.1145/774572 (Conference proceedings)

Publication series

Name	Proceedings of the IEEE/ACM international conference on Computer-aided design, ICCAD
ISSN (Print)	1092-3152

Conference

Conference	2002 IEEE/ACM International Conference on Computer-Aided Design, ICCAD 2002
Country/Territory	United States
City	San Jose
Period	10/11/02 → 14/11/02
Internet address	https://dl.acm.org/doi/proceedings/10.1145/774572 (Conference proceedings)

Scopus Subject Areas

Software
Computer Science Applications
Computer Graphics and Computer-Aided Design

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10.1145/774572.774648

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Tian, R., Yu, R., Tang, X., & Wong, D. F. (2002). On mask layout partitioning for electron projection lithography. In Proceedings of The IEEE/ACM International Conference on Computer-Aided Design, ICCAD 2002 (pp. 514-518). (Proceedings of the IEEE/ACM international conference on Computer-aided design, ICCAD). Association for Computing Machinery (ACM). https://doi.org/10.1145/774572.774648

Tian, Ruiqi ; Yu, Ronggang ; Tang, Xiaoping et al. / On mask layout partitioning for electron projection lithography. Proceedings of The IEEE/ACM International Conference on Computer-Aided Design, ICCAD 2002. United States : Association for Computing Machinery (ACM), 2002. pp. 514-518 (Proceedings of the IEEE/ACM international conference on Computer-aided design, ICCAD).

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title = "On mask layout partitioning for electron projection lithography",

abstract = "Electron projection lithography (EPL) is a leading candidate for next generation lithography (NGL) in VLSI production. The membrane mask used in EPL is divided into sub-fields by struts for structural support. A layout must be partitioned into these sub-fields on mask and then stitched back together by the EPL tool on wafer. To minimize possible stitching errors, partitioning of a mask layout should minimize cuts of layout features in the overlapping area between two adjacent sub-fields. This paper presents the first formulation of the mask layout partitioning problem for EPL as a graph problem. The graph formulation is optimally solved with a shortest path approach. Two other techniques are also presented to speed up computation. Experimental runs on data from a real industry design show excellent results.",

author = "Ruiqi Tian and Ronggang Yu and Xiaoping Tang and Wong, {D. F.}",

note = "Funding information: The work of D.F. Wong was partially supported by the National Science Foundation under grant CCR-9912390. Publisher copyright: {\textcopyright} 2002 ACM; 2002 IEEE/ACM International Conference on Computer-Aided Design, ICCAD 2002 ; Conference date: 10-11-2002 Through 14-11-2002",

year = "2002",

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doi = "10.1145/774572.774648",

language = "English",

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series = "Proceedings of the IEEE/ACM international conference on Computer-aided design, ICCAD",

publisher = "Association for Computing Machinery (ACM)",

pages = "514--518",

booktitle = "Proceedings of The IEEE/ACM International Conference on Computer-Aided Design, ICCAD 2002",

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Tian, R, Yu, R, Tang, X & Wong, DF 2002, On mask layout partitioning for electron projection lithography. in Proceedings of The IEEE/ACM International Conference on Computer-Aided Design, ICCAD 2002. Proceedings of the IEEE/ACM international conference on Computer-aided design, ICCAD, Association for Computing Machinery (ACM), United States, pp. 514-518, 2002 IEEE/ACM International Conference on Computer-Aided Design, ICCAD 2002, San Jose, California, United States, 10/11/02. https://doi.org/10.1145/774572.774648

On mask layout partitioning for electron projection lithography. / Tian, Ruiqi; Yu, Ronggang; Tang, Xiaoping et al.
Proceedings of The IEEE/ACM International Conference on Computer-Aided Design, ICCAD 2002. United States: Association for Computing Machinery (ACM), 2002. p. 514-518 (Proceedings of the IEEE/ACM international conference on Computer-aided design, ICCAD).

Research output: Chapter in book/report/conference proceeding › Conference proceeding › peer-review

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T1 - On mask layout partitioning for electron projection lithography

AU - Tian, Ruiqi

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AU - Tang, Xiaoping

AU - Wong, D. F.

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N2 - Electron projection lithography (EPL) is a leading candidate for next generation lithography (NGL) in VLSI production. The membrane mask used in EPL is divided into sub-fields by struts for structural support. A layout must be partitioned into these sub-fields on mask and then stitched back together by the EPL tool on wafer. To minimize possible stitching errors, partitioning of a mask layout should minimize cuts of layout features in the overlapping area between two adjacent sub-fields. This paper presents the first formulation of the mask layout partitioning problem for EPL as a graph problem. The graph formulation is optimally solved with a shortest path approach. Two other techniques are also presented to speed up computation. Experimental runs on data from a real industry design show excellent results.

AB - Electron projection lithography (EPL) is a leading candidate for next generation lithography (NGL) in VLSI production. The membrane mask used in EPL is divided into sub-fields by struts for structural support. A layout must be partitioned into these sub-fields on mask and then stitched back together by the EPL tool on wafer. To minimize possible stitching errors, partitioning of a mask layout should minimize cuts of layout features in the overlapping area between two adjacent sub-fields. This paper presents the first formulation of the mask layout partitioning problem for EPL as a graph problem. The graph formulation is optimally solved with a shortest path approach. Two other techniques are also presented to speed up computation. Experimental runs on data from a real industry design show excellent results.

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Tian R, Yu R, Tang X, Wong DF. On mask layout partitioning for electron projection lithography. In Proceedings of The IEEE/ACM International Conference on Computer-Aided Design, ICCAD 2002. United States: Association for Computing Machinery (ACM). 2002. p. 514-518. (Proceedings of the IEEE/ACM international conference on Computer-aided design, ICCAD). doi: 10.1145/774572.774648

On mask layout partitioning for electron projection lithography

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