Near field imaging from multilayer lens

Multilayer superlens has been reported that it had advantages over the single metal layer superlens. In this work, single silver layer and Ag-SiO ₂ multilayer superlens devices working at wavelength of 365 nm were fabricated using standard photolithography method. Grating objects with line/space (190 nm/190 nm) resolution could be resolved through both kinds of lens structures with working distance up to 128 nm. However, Ag-SiO ₂ multilayer lens shows higher transmittance and image contrast than the single silver layer device, the experimental result proves the theoretical calculation.