Minimally destructive and multi-element analysis of aluminium alloys by ArF laser-induced atomic emissions

Aluminium alloys were analysed by ArF laser-induced atomic emissions of laser plumes. The vapour plume was created by a Nd:YAG laser pulse at 1064 nm. Unlike laser-excited atomic fluorescence, when only one transition was excited at one wavelength, numerous analytes were induced to emit simultaneously at the single excitation wavelength of 193 nm. Detection limits for Na, Mg, Si and Cu were 83, 240, 590 and 470 ng g^-1, respectively. They were established under conditions of minimal sample destruction. The mass detection limits were in the tens of attomoles. Because of the high sensitivity even at low etch rates, depth profiling at sub-nm resolution was possible. Prompt segregation of trace impurities towards the target surface was revealed.