Abstract
Nanometer VLSI design is greatly challanged by the growing interdependency between manufacturing and design. Existing approaches in design for manufacturability (DFM) are still mostly post design, rather than during design. To really bridge the gap between design and manufacturing, it is important to model and feed proper manufacturing metrics and cost functions upstream, especially at the key physical layout optimization stages such as routing and placement, to have major impacts. In this paper, we show several aspects of the true manufactruability-aware physical design, from lithography-aware routing, to redundant-via aware routing, to CMP aware florplanning and placement, and show their promises.
Original language | English |
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Title of host publication | 2005 International Conference on Integrated Circuit Design and Technology, ICICDT |
Publisher | IEEE |
Pages | 149-153 |
Number of pages | 5 |
ISBN (Print) | 0780390814, 9780780390812 |
DOIs | |
Publication status | Published - May 2005 |
Event | 2005 International Conference on Integrated Circuit Design and Technology, ICICDT - Austin, United States Duration: 9 May 2005 → 11 May 2005 https://ieeexplore.ieee.org/xpl/conhome/10047/proceeding |
Publication series
Name | International Conference on Integrated Circuit Design and Technology, ICICDT |
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ISSN (Print) | 2381-3555 |
Conference
Conference | 2005 International Conference on Integrated Circuit Design and Technology, ICICDT |
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Country/Territory | United States |
City | Austin |
Period | 9/05/05 → 11/05/05 |
Internet address |
Scopus Subject Areas
- General Engineering