Linear time algorithm to find all relocation positions for EUV defect mitigation

Yuelin Du, Hongbo Zhang, Qiang Ma, Martin D. F. Wong

Research output: Chapter in book/report/conference proceedingConference proceedingpeer-review

4 Citations (Scopus)

Abstract

Due to the absence of defect-free blanks in extreme ultraviolet (EUV) lithography, defect mitigation is necessary before mass production. One effective defect mitigation approach is to cover defects by device features, such that the defects will no longer be printable. Normally die size is much smaller than the exposure field on the blank, such that one blank can accommodate multiple copies of a die, each of which can be placed independently within the exposure field. For thorough utilization of blank area, the number of valid dies that are not impacted by any defects should be maximized. To do so, all relocation positions to place a single valid die on a defective blank must be determined first [1]. To the best of our knowledge, no existing work can find all relocation positions throughout the whole blank in a reasonable amount of time. In this paper, we develop an efficient algorithm to solve this problem. The time complexity of our algorithm is linear in the number of features in the die. Experimental results with full die layouts generated from a standard cell library validate the efficiency of our algorithm. Comparing to the algorithm in [2] which runs more than one week without termination, our algorithm only takes several hours to find all relocation positions for a die with millions of features.
Original languageEnglish
Title of host publication2013 18th Asia and South Pacific Design Automation Conference (ASP-DAC)
PublisherIEEE Canada
Pages261-266
Number of pages6
ISBN (Electronic)9781467330305, 9781467330282
ISBN (Print)9781467330299
DOIs
Publication statusPublished - 22 Jan 2013
Event18th Asia and South Pacific Design Automation Conference, ASP-DAC 2013 - Yokohama, Japan
Duration: 22 Jan 201325 Jan 2013
https://www.aspdac.com/aspdac2013/ (Conference website)
https://ieeexplore.ieee.org/xpl/conhome/6507004/proceeding (Conference proceedings)

Publication series

NameProceedings of the ASP-DAC Asia South Pacific Design Automation Conference
PublisherIEEE
ISSN (Print)2153-6961

Conference

Conference18th Asia and South Pacific Design Automation Conference, ASP-DAC 2013
Country/TerritoryJapan
CityYokohama
Period22/01/1325/01/13
Internet address

User-Defined Keywords

  • Layout
  • Time complexity
  • Runtime
  • Algorithm design and analysis
  • Partitioning algorithms
  • Ultraviolet sources
  • Fabrication

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