Layout optimization and template pattern verification for directed self-assembly (DSA)

Zigang Xiao; Daifeng Guo; Martin D. F. Wong; He Yi; Maryann C. Tung; H.-S. Philip Wong

doi:10.1145/2744769.2747934

Layout optimization and template pattern verification for directed self-assembly (DSA)

Zigang Xiao, Daifeng Guo, Martin D. F. Wong, He Yi, Maryann C. Tung, H.-S. Philip Wong

Office of the Provost

Research output: Chapter in book/report/conference proceeding › Chapter › peer-review

5 Citations (Scopus)

Abstract

Recently, block copolymer directed self-assembly (DSA) has demonstrated great advantages in patterning contacts/vias for the 7 nm technology node and beyond. The high throughput and low process cost of DSA makes it the most promising candidate in patterning tight pitched dense patterns for the next generation lithography. Since DSA is very sensitive to the shapes and distributions of the guiding templates, it is necessary to develop new EDA algorithms and tools to address the patterning rules and constraints of the process. This paper presents a set of DSA-aware optimization techniques targeting the most urgent problems for DSA technology, including layout optimization and template pattern verification.

Original language	English
Title of host publication	52nd ACM/IEEE Design Automation Conference 2015
Publisher	Association for Computing Machinery (ACM)
Pages	1–6
Number of pages	6
ISBN (Electronic)	9781450335201
DOIs	https://doi.org/10.1145/2744769.2747934
Publication status	Published - Jun 2015
Event	52nd ACM/ IEEE Design Automation Conference, DAC 2015 - San Francisco, United States Duration: 7 Jun 2015 → 11 Jun 2015 https://dl.acm.org/doi/proceedings/10.1145/2744769 (Conference proceedings) https://ieeexplore.ieee.org/xpl/conhome/7155749/proceeding (Conference proceedings)

Publication series

Name	Proceedings of ACM/IEEE Design Automation Conference

Conference

Conference	52nd ACM/ IEEE Design Automation Conference, DAC 2015
Country/Territory	United States
City	San Francisco
Period	7/06/15 → 11/06/15
Internet address	https://dl.acm.org/doi/proceedings/10.1145/2744769 (Conference proceedings) https://ieeexplore.ieee.org/xpl/conhome/7155749/proceeding (Conference proceedings)

Access to Document

10.1145/2744769.2747934

Cite this

Xiao, Z., Guo, D., Wong, M. D. F., Yi, H., Tung, M. C., & Wong, H.-S. P. (2015). Layout optimization and template pattern verification for directed self-assembly (DSA). In 52nd ACM/IEEE Design Automation Conference 2015 (pp. 1–6). (Proceedings of ACM/IEEE Design Automation Conference). Association for Computing Machinery (ACM). https://doi.org/10.1145/2744769.2747934

@inbook{ab503fd7d44e4906aae4797f01803b3f,

title = "Layout optimization and template pattern verification for directed self-assembly (DSA)",

abstract = "Recently, block copolymer directed self-assembly (DSA) has demonstrated great advantages in patterning contacts/vias for the 7 nm technology node and beyond. The high throughput and low process cost of DSA makes it the most promising candidate in patterning tight pitched dense patterns for the next generation lithography. Since DSA is very sensitive to the shapes and distributions of the guiding templates, it is necessary to develop new EDA algorithms and tools to address the patterning rules and constraints of the process. This paper presents a set of DSA-aware optimization techniques targeting the most urgent problems for DSA technology, including layout optimization and template pattern verification.",

author = "Zigang Xiao and Daifeng Guo and Wong, {Martin D. F.} and He Yi and Tung, {Maryann C.} and Wong, {H.-S. Philip}",

note = "Funding Information: This work was partially supported by the National Science Foundation under Grants CCF-1421563 and CCF-1421292. Maryann C. Tung is support in part by an NSF Fellowship. Publisher Copyright: {\textcopyright} 2015 ACM; 52nd ACM/ IEEE Design Automation Conference, DAC 2015 ; Conference date: 07-06-2015 Through 11-06-2015",

year = "2015",

month = jun,

doi = "10.1145/2744769.2747934",

language = "English",

series = "Proceedings of ACM/IEEE Design Automation Conference",

publisher = "Association for Computing Machinery (ACM)",

pages = "1–6",

booktitle = "52nd ACM/IEEE Design Automation Conference 2015",

address = "United States",

url = "https://dl.acm.org/doi/proceedings/10.1145/2744769, https://ieeexplore.ieee.org/xpl/conhome/7155749/proceeding",

}

Xiao, Z, Guo, D, Wong, MDF, Yi, H, Tung, MC & Wong, H-SP 2015, Layout optimization and template pattern verification for directed self-assembly (DSA). in 52nd ACM/IEEE Design Automation Conference 2015. Proceedings of ACM/IEEE Design Automation Conference, Association for Computing Machinery (ACM), pp. 1–6, 52nd ACM/ IEEE Design Automation Conference, DAC 2015, San Francisco, California, United States, 7/06/15. https://doi.org/10.1145/2744769.2747934

Layout optimization and template pattern verification for directed self-assembly (DSA). / Xiao, Zigang; Guo, Daifeng; Wong, Martin D. F. et al.
52nd ACM/IEEE Design Automation Conference 2015. Association for Computing Machinery (ACM), 2015. p. 1–6 (Proceedings of ACM/IEEE Design Automation Conference).

Research output: Chapter in book/report/conference proceeding › Chapter › peer-review

TY - CHAP

T1 - Layout optimization and template pattern verification for directed self-assembly (DSA)

AU - Xiao, Zigang

AU - Guo, Daifeng

AU - Wong, Martin D. F.

AU - Yi, He

AU - Tung, Maryann C.

AU - Wong, H.-S. Philip

N1 - Funding Information: This work was partially supported by the National Science Foundation under Grants CCF-1421563 and CCF-1421292. Maryann C. Tung is support in part by an NSF Fellowship. Publisher Copyright: © 2015 ACM

PY - 2015/6

Y1 - 2015/6

N2 - Recently, block copolymer directed self-assembly (DSA) has demonstrated great advantages in patterning contacts/vias for the 7 nm technology node and beyond. The high throughput and low process cost of DSA makes it the most promising candidate in patterning tight pitched dense patterns for the next generation lithography. Since DSA is very sensitive to the shapes and distributions of the guiding templates, it is necessary to develop new EDA algorithms and tools to address the patterning rules and constraints of the process. This paper presents a set of DSA-aware optimization techniques targeting the most urgent problems for DSA technology, including layout optimization and template pattern verification.

AB - Recently, block copolymer directed self-assembly (DSA) has demonstrated great advantages in patterning contacts/vias for the 7 nm technology node and beyond. The high throughput and low process cost of DSA makes it the most promising candidate in patterning tight pitched dense patterns for the next generation lithography. Since DSA is very sensitive to the shapes and distributions of the guiding templates, it is necessary to develop new EDA algorithms and tools to address the patterning rules and constraints of the process. This paper presents a set of DSA-aware optimization techniques targeting the most urgent problems for DSA technology, including layout optimization and template pattern verification.

UR - https://dl.acm.org/doi/10.1145/2744769.2747934

UR - https://ieeexplore.ieee.org/document/7167384

UR - https://www.scopus.com/record/display.uri?eid=2-s2.0-84944111496&origin=inward

U2 - 10.1145/2744769.2747934

DO - 10.1145/2744769.2747934

M3 - Chapter

T3 - Proceedings of ACM/IEEE Design Automation Conference

SP - 1

EP - 6

BT - 52nd ACM/IEEE Design Automation Conference 2015

PB - Association for Computing Machinery (ACM)

T2 - 52nd ACM/ IEEE Design Automation Conference, DAC 2015

Y2 - 7 June 2015 through 11 June 2015

ER -

Layout optimization and template pattern verification for directed self-assembly (DSA)

Abstract

Publication series

Conference

Access to Document

Other files and links

Fingerprint

Cite this