Laminar flow used as "liquid etch mask" in wet chemical etching to generate glass microstructures with an improved aspect ratio

Xuan Mu; Qionglin Liang; Ping Hu; Kangning REN; Yiming Wang; Guoan Luo

doi:10.1039/b904769g

Laminar flow used as "liquid etch mask" in wet chemical etching to generate glass microstructures with an improved aspect ratio

Xuan Mu, Qionglin Liang^*, Ping Hu, Kangning REN, Yiming Wang, Guoan Luo

^*Corresponding author for this work

Department of Chemistry

Research output: Contribution to journal › Journal article › peer-review

29 Citations (Scopus)

Abstract

A new method of anisotropic etching an amorphous bulk material is proposed in this paper. Laminar flow is employed in this method to mask the flow of an etchant and is termed as "liquid etch mask". Since this mask has the physical properties of a liquid, it brings several advantages that could not be achieved by any kind of other etch mask in the solid phase. As a consequence, the aspect ratio of the glass channel could be improved to ∼1 while in an inexpensive and convenient manner.

Original language	English
Pages (from-to)	1994-1996
Number of pages	3
Journal	Lab on a Chip
Volume	9
Issue number	14
DOIs	https://doi.org/10.1039/b904769g
Publication status	Published - 2009

Scopus Subject Areas

Bioengineering
Biochemistry
Chemistry(all)
Biomedical Engineering

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abstract = "A new method of anisotropic etching an amorphous bulk material is proposed in this paper. Laminar flow is employed in this method to mask the flow of an etchant and is termed as {"}liquid etch mask{"}. Since this mask has the physical properties of a liquid, it brings several advantages that could not be achieved by any kind of other etch mask in the solid phase. As a consequence, the aspect ratio of the glass channel could be improved to ∼1 while in an inexpensive and convenient manner.",

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AU - Mu, Xuan

AU - Liang, Qionglin

AU - Hu, Ping

AU - REN, Kangning

AU - Wang, Yiming

AU - Luo, Guoan

PY - 2009

Y1 - 2009

N2 - A new method of anisotropic etching an amorphous bulk material is proposed in this paper. Laminar flow is employed in this method to mask the flow of an etchant and is termed as "liquid etch mask". Since this mask has the physical properties of a liquid, it brings several advantages that could not be achieved by any kind of other etch mask in the solid phase. As a consequence, the aspect ratio of the glass channel could be improved to ∼1 while in an inexpensive and convenient manner.

AB - A new method of anisotropic etching an amorphous bulk material is proposed in this paper. Laminar flow is employed in this method to mask the flow of an etchant and is termed as "liquid etch mask". Since this mask has the physical properties of a liquid, it brings several advantages that could not be achieved by any kind of other etch mask in the solid phase. As a consequence, the aspect ratio of the glass channel could be improved to ∼1 while in an inexpensive and convenient manner.

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DO - 10.1039/b904769g

M3 - Journal article

C2 - 19568665

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SP - 1994

EP - 1996

JO - Lab on a Chip

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IS - 14

ER -

Laminar flow used as "liquid etch mask" in wet chemical etching to generate glass microstructures with an improved aspect ratio

Abstract

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