Laminar flow used as "liquid etch mask" in wet chemical etching to generate glass microstructures with an improved aspect ratio

Xuan Mu, Qionglin Liang*, Ping Hu, Kangning REN, Yiming Wang, Guoan Luo

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

19 Citations (Scopus)

Abstract

A new method of anisotropic etching an amorphous bulk material is proposed in this paper. Laminar flow is employed in this method to mask the flow of an etchant and is termed as "liquid etch mask". Since this mask has the physical properties of a liquid, it brings several advantages that could not be achieved by any kind of other etch mask in the solid phase. As a consequence, the aspect ratio of the glass channel could be improved to ∼1 while in an inexpensive and convenient manner.

Original languageEnglish
Pages (from-to)1994-1996
Number of pages3
JournalLab on a Chip
Volume9
Issue number14
DOIs
Publication statusPublished - 2009

Scopus Subject Areas

  • Bioengineering
  • Biochemistry
  • Chemistry(all)
  • Biomedical Engineering

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