Kinetic roughening in molecular-beam epitaxy

Lei Han TANG*, Thomas Nattermann

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

103 Citations (Scopus)

Abstract

We extend a continuum model recently proposed by Villain [J. Phys. I (France) 1, 19 (1991)] to study equilibrium and nonequilibrium diffusion on a high-symmetry surface under a fluctuating particle beam. Exponents characterizing dynamic scaling in various regimes are derived explicitly in all dimensions, as well as the relevant lengths which separate these regimes. Different surface morphologies are correlated with experimentally accessible parameters such as substrate temperature and deposition rate.

Original languageEnglish
Pages (from-to)2899-2902
Number of pages4
JournalPhysical Review Letters
Volume66
Issue number22
DOIs
Publication statusPublished - 1991

Scopus Subject Areas

  • Physics and Astronomy(all)

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