Abstract
As the device shapes keep shrinking, the designs are more sensitive to manufacturing processes. In order to improve performance predictability and yield, mask layout uniformity/evenness is highly desired, and it is usually measured by the feature density with defined feasible range in manufacture process design rules. To address the density control problem, one fundamental problem is how to calculate density accurately and efficiently. In this paper, we propose a fast exact algorithm to identify the maximum density for a given layout. Compared with the existing exact algorithms, our algorithm reduces the running time from days/hours to a few minutes/seconds. And it is even faster than the existing approximate algorithms in literature.
Original language | English |
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Title of host publication | ISPD '07 |
Subtitle of host publication | Proceedings of the 2007 International Symposium on Physical Design |
Publisher | Association for Computing Machinery (ACM) |
Pages | 19-26 |
Number of pages | 8 |
ISBN (Print) | 9781595936134 |
DOIs | |
Publication status | Published - 18 Mar 2007 |
Event | 16th International Symposium on Physical Design, ISPD 2007 - Austin , United States Duration: 18 Mar 2007 → 21 Mar 2007 https://dl.acm.org/doi/proceedings/10.1145/1231996 (Conference proceedings) |
Publication series
Name | Proceedings of the International Symposium on Physical Design, ISPD |
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Symposium
Symposium | 16th International Symposium on Physical Design, ISPD 2007 |
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Country/Territory | United States |
City | Austin |
Period | 18/03/07 → 21/03/07 |
Internet address |
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Scopus Subject Areas
- Electrical and Electronic Engineering
User-Defined Keywords
- Density
- Fix-dissection
- DFM