In清洁表面氧吸附及早期氧化的CLS和AES研究

戴道宣; Furong 朱福荣

In清洁表面氧吸附及早期氧化的CLS和AES研究

Translated title of the contribution: CLS and AES Studies of Oxygen Adsorption and Initial Oxidation on Clean In Surface

戴道宣^*
, 朱福荣

^*Corresponding author for this work

Department of Physics

Research output: Contribution to journal › Journal article › peer-review

Abstract

The adsorption of oxygen and initial stages of oxidation on clean In surface were studied using CLS and AES. It was observed that the oxygen was already absorbed on the surface at low oxygen exposure down to 10^-2LO₂. A monolayer oxide on In can be found at exposure of 10²LO₂ and a continuous metal free thicker oxide layer at 10³LO₂, then a fast adsorption stage is followed by a slower one after 10³LO₂.

Translated title of the contribution	CLS and AES Studies of Oxygen Adsorption and Initial Oxidation on Clean In Surface
Original language	Chinese (Simplified)
Pages (from-to)	162-164
Number of pages	3
Journal	金属学报
Volume	23
Issue number	2
Publication status	Published - Apr 1987

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https://www.ams.org.cn/CN/Y1987/V23/I2/162

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title = "In清洁表面氧吸附及早期氧化的CLS和AES研究",

abstract = "The adsorption of oxygen and initial stages of oxidation on clean In surface were studied using CLS and AES. It was observed that the oxygen was already absorbed on the surface at low oxygen exposure down to 10-2LO2. A monolayer oxide on In can be found at exposure of 102LO2 and a continuous metal free thicker oxide layer at 103LO2, then a fast adsorption stage is followed by a slower one after 103LO2.",

author = "戴道宣 and 朱福荣",

year = "1987",

month = apr,

language = "Chinese (Simplified)",

volume = "23",

pages = "162--164",

journal = "金属学报",

issn = "0412-1961",

publisher = "中国金属学会",

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AU - 戴道宣, null

AU - 朱福荣, null

PY - 1987/4

Y1 - 1987/4

N2 - The adsorption of oxygen and initial stages of oxidation on clean In surface were studied using CLS and AES. It was observed that the oxygen was already absorbed on the surface at low oxygen exposure down to 10-2LO2. A monolayer oxide on In can be found at exposure of 102LO2 and a continuous metal free thicker oxide layer at 103LO2, then a fast adsorption stage is followed by a slower one after 103LO2.

AB - The adsorption of oxygen and initial stages of oxidation on clean In surface were studied using CLS and AES. It was observed that the oxygen was already absorbed on the surface at low oxygen exposure down to 10-2LO2. A monolayer oxide on In can be found at exposure of 102LO2 and a continuous metal free thicker oxide layer at 103LO2, then a fast adsorption stage is followed by a slower one after 103LO2.

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SN - 0412-1961

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JO - 金属学报

JF - 金属学报

IS - 2

ER -

In清洁表面氧吸附及早期氧化的CLS和AES研究

Abstract

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