Hybrid lithography optimization with E-Beam and immersion processes for 16nm 1D gridded design

Yuelin Du, Hongbo Zhang, Martin D.F. Wong, Kai-Yuan Chao

Research output: Chapter in book/report/conference proceedingConference proceedingpeer-review

45 Citations (Scopus)

Abstract

Since some of major IC industry participants are moving to the highly regular 1D gridded designs to enable scaling to sub-20nm nodes, how to manufacture the randomly distributed cuts with reasonable throughput and process variation becomes a big challenge. With the help of hybrid lithography, people can apply different types of processes for one single layer manufacturing such that the advantages from different technologies can be combined together to further benefit manufacturing. In this paper, targeting cut printing difficulties and hybrid lithography with electron beam (E-Beam) and 193 nm immersion (193i) processes, we propose a novel algorithm to optimally assign cuts to 193i or E-Beam processes with proper modifications on cut distribution, in order to maximize the overall throughput. To validate our method, we construct our algorithm based on the forbidden patterns obtained from the optical simulation; then we formulate the redistribution problem into a well defined ILP problem and finally call a reliable solver to solve the whole problem. Experimental results show that the throughput is dramatically improved by the cut redistribution. Besides that, for sparser layers, the EBL process can be totaly saved, which largely reduces the fabrication cost.
Original languageEnglish
Title of host publication17th Asia and South Pacific Design Automation Conference
PublisherIEEE Canada
Pages707-712
Number of pages6
ISBN (Electronic)9781467307727, 9781467307710
ISBN (Print)9781467307703
DOIs
Publication statusPublished - 30 Jan 2012
Event17th Asia and South Pacific Design Automation Conference, ASP-DAC 2012 - Sydney, NSW, Australia
Duration: 30 Jan 20122 Feb 2012

Publication series

NameProceedings of the ASP-DAC Asia South Pacific Design Automation Conference
PublisherIEEE
ISSN (Print)2153-6961
ISSN (Electronic)2153-697X

Conference

Conference17th Asia and South Pacific Design Automation Conference, ASP-DAC 2012
Period30/01/122/02/12

User-Defined Keywords

  • Lithography
  • Layout
  • Wires
  • Target tracking
  • Metals
  • Throughput
  • Printing
  • Hybrid Lithography
  • E-Beam Lithography
  • 1-D Gridded Design
  • Cut Redistribution

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