Hot spot detection for indecomposable self-aligned double patterning layout

Hongbo Zhang*, Yuelin Du, Martin D.F. Wong, Rasit O. Topaloglu

*Corresponding author for this work

Research output: Chapter in book/report/conference proceedingConference proceedingpeer-review

6 Citations (Scopus)

Abstract

Self-aligned double patterning (SADP) lithography is a novel lithography technology which has the capability to define critical dimension (CD) using one single exposure, therefore holding a great opportunity for the next generation lithography process for the overlay mitigation. However, a necessary design manufacturing co-optimization step - the non-decomposability position detection (hot spot detection) - is still immature. In this paper, targeting the hot spot detection difficulties in SADP process, we first revisit out previous ILP-based SADP decomposition algorithm and provide an extended ILP-based hot spot detection without any preconditions on the design. Then, with some simple requirement that is commonly seen in 2D random layout, we further provided a graph based hot spot detection for an efficient hot spot detection. From the Nangate standard cell library, our experiment validates the hot spot detection process and demonstrates an SADP friendly design tyle is necessary for the upcoming 14nm technology node.

Original languageEnglish
Title of host publicationPhotomask Technology 2011
EditorsWilhelm Maurer, Frank E. Abboud
PublisherSPIE
ISBN (Print)9780819487919
DOIs
Publication statusPublished - Sept 2011
EventPhotomask Technology 2011 - Monterey, United States
Duration: 19 Sept 201122 Sept 2011
https://www.spiedigitallibrary.org/conference-proceedings-of-spie/8166.toc#FrontMatterVolume8166

Publication series

NameProceedings of SPIE - The International Society for Optical Engineering
Volume8166
ISSN (Print)0277-786X

Conference

ConferencePhotomask Technology 2011
Country/TerritoryUnited States
CityMonterey
Period19/09/1122/09/11
Internet address

Scopus Subject Areas

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Computer Science Applications
  • Applied Mathematics
  • Electrical and Electronic Engineering

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