Fast and accurate OPC for standard-cell layouts

David M. Pawlowski, Liang Deng, Martin D. F. Wong

Research output: Chapter in book/report/conference proceedingConference proceedingpeer-review

12 Citations (Scopus)


Model based optical proximity correction (OPC) has become necessary at 90nm technology node and beyond. Cell-wise OPC is an attractive technique to reduce the mask data size as well as the prohibitive runtime of full-chip OPC. As feature dimensions have gotten smaller, the radius of influence for edge features has extended further into neighboring cells such that it is no longer sufficient to perform cellwise OPC independent of neighboring cells, especially for the critical layers. The methodology described in this work accounts for features in neighboring cells and allows a cellwise approach to be applied to cells with a printed gate length of 45nm with the projection that it can also be applied to future technology nodes. OPC-ready cells are generated at library creation (independent of placement) using a boundary-based technique. Each cell has a tractable number of OPC-ready versions due to an intelligent characterization of standard cell layout features. Total number of cells with boundaries in the OPC-ready library only increases linearly with the number of cells in the original library. Results are very promising: the average edge placement error (EPE) for all metal1 features in 100 layouts is 0.731nm which is less than 1 % of metal1 width, creating similar levels of lithographic accuracy while obviating any of the drawbacks inherent in layout specific full-chip model-based OPC. For even small circuits, there were runtime reductions of up to 100× and a potential 35× decrease in mask data size.

Original languageEnglish
Title of host publicationProceedings of The 12th Asia and South Pacific Design Automation Conference, ASP-DAC 2007
Number of pages6
ISBN (Print)9781424406296, 1424406293
Publication statusPublished - 24 Jan 2007
Event12th Asia and South Pacific Design Automation Conference, ASP-DAC 2007 - Pacifico Yokohama, Yokohama, Japan
Duration: 23 Jan 200726 Jan 2007 (Conference website) (Conference programme) (Conference proceedings)

Publication series

NameProceedings of the Asia and South Pacific Design Automation Conference, ASP-DAC
ISSN (Print)2153-6961
ISSN (Electronic)2153-697X


Conference12th Asia and South Pacific Design Automation Conference, ASP-DAC 2007
Internet address

Scopus Subject Areas

  • Computer Science Applications
  • Computer Graphics and Computer-Aided Design
  • Electrical and Electronic Engineering


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