Evidence of nitric-oxide-induced surface band bending of indium tin oxide

Jianqiao Hu; Jisheng Pan; Furong Zhu; Hao Gong

doi:10.1063/1.1719268

Evidence of nitric-oxide-induced surface band bending of indium tin oxide

Jianqiao Hu, Jisheng Pan, Furong Zhu^*, Hao Gong

^*Corresponding author for this work

Department of Physics

Research output: Contribution to journal › Journal article › peer-review

17 Citations (Scopus)

Abstract

The interaction of indium tin oxide (ITO) film with nitric oxide (NO) has been investigated in situ by a four-point probe and x-ray photoelectron spectroscopy (XPS). The XPS N 1s peak emerged at a high binding energy of 404 eV indicating that NO was molecularly adsorbed on ITO surface. The adsorption of NO on ITO surface also induced a 0.2 eV shift in its valence band maximum to the low binding energy side leading to an upward surface band bending. We have shown that the increase in the ITO sheet resistance was attributed to its surface band bending.

Original language	English
Pages (from-to)	6273-6276
Number of pages	4
Journal	Journal of Applied Physics
Volume	95
Issue number	11
DOIs	https://doi.org/10.1063/1.1719268
Publication status	Published - 1 Jun 2004

Scopus Subject Areas

Physics and Astronomy(all)

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10.1063/1.1719268

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title = "Evidence of nitric-oxide-induced surface band bending of indium tin oxide",

abstract = "The interaction of indium tin oxide (ITO) film with nitric oxide (NO) has been investigated in situ by a four-point probe and x-ray photoelectron spectroscopy (XPS). The XPS N 1s peak emerged at a high binding energy of 404 eV indicating that NO was molecularly adsorbed on ITO surface. The adsorption of NO on ITO surface also induced a 0.2 eV shift in its valence band maximum to the low binding energy side leading to an upward surface band bending. We have shown that the increase in the ITO sheet resistance was attributed to its surface band bending.",

author = "Jianqiao Hu and Jisheng Pan and Furong Zhu and Hao Gong",

note = "Publisher copyright: {\textcopyright} 2004 American Institute of Physics",

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T1 - Evidence of nitric-oxide-induced surface band bending of indium tin oxide

AU - Hu, Jianqiao

AU - Pan, Jisheng

AU - Zhu, Furong

AU - Gong, Hao

PY - 2004/6/1

Y1 - 2004/6/1

N2 - The interaction of indium tin oxide (ITO) film with nitric oxide (NO) has been investigated in situ by a four-point probe and x-ray photoelectron spectroscopy (XPS). The XPS N 1s peak emerged at a high binding energy of 404 eV indicating that NO was molecularly adsorbed on ITO surface. The adsorption of NO on ITO surface also induced a 0.2 eV shift in its valence band maximum to the low binding energy side leading to an upward surface band bending. We have shown that the increase in the ITO sheet resistance was attributed to its surface band bending.

AB - The interaction of indium tin oxide (ITO) film with nitric oxide (NO) has been investigated in situ by a four-point probe and x-ray photoelectron spectroscopy (XPS). The XPS N 1s peak emerged at a high binding energy of 404 eV indicating that NO was molecularly adsorbed on ITO surface. The adsorption of NO on ITO surface also induced a 0.2 eV shift in its valence band maximum to the low binding energy side leading to an upward surface band bending. We have shown that the increase in the ITO sheet resistance was attributed to its surface band bending.

UR - http://www.scopus.com/inward/record.url?scp=2942666088&partnerID=8YFLogxK

U2 - 10.1063/1.1719268

DO - 10.1063/1.1719268

M3 - Journal article

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VL - 95

SP - 6273

EP - 6276

JO - Journal of Applied Physics

JF - Journal of Applied Physics

IS - 11

ER -

Evidence of nitric-oxide-induced surface band bending of indium tin oxide

Abstract

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