Envisioning Outlier Exposure by Large Language Models for Out-of-Distribution Detection

Chentao Cao, Zhun Zhong*, Zhanke Zhou, Yang Liu, Tongliang Liu, Bo Han*

*Corresponding author for this work

Research output: Chapter in book/report/conference proceedingConference proceedingpeer-review

Abstract

Detecting out-of-distribution (OOD) samples is essential when deploying machine learning models in open-world scenarios. Zero-shot OOD detection, requiring no training on in-distribution (ID) data, has been possible with the advent of vision-language models like CLIP. Existing methods build a text-based classifier with only closed-set labels. However, this largely restricts the inherent capability of CLIP to recognize samples from large and open label space. In this paper, we propose to tackle this constraint by leveraging the expert knowledge and reasoning capability of large language models (LLM) to Envision potential Outlier Exposure, termed EOE, without access to any actual OOD data. Owing to better adaptation to open-world scenarios, EOE can be generalized to different tasks, including far, near, and fine-grained OOD detection. Technically, we design (1) LLM prompts based on visual similarity to generate potential outlier class labels specialized for OOD detection, as well as (2) a new score function based on potential outlier penalty to distinguish hard OOD samples effectively. Empirically, EOE achieves state-of-the-art performance across different OOD tasks and can be effectively scaled to the ImageNet-1K dataset. The code is publicly available at: https://github.com/tmlr-group/EOE.
Original languageEnglish
Title of host publicationProceedings of 41th International Conference on Machine Learning, ICML 2024
EditorsRuslan Salakhutdinov, Zico Kolter, Katherine Heller, Adrian Weller, Nuria Oliver, Jonathan Scarlett, Felix Berkenkamp
PublisherML Research Press
Pages5629-5659
Number of pages31
Publication statusPublished - 21 Jul 2024
Event41st International Conference on Machine Learning, ICML 2024 - Vienna, Austria
Duration: 21 Jul 202427 Jul 2024
https://icml.cc/
https://openreview.net/group?id=ICML.cc/2024/Conference#tab-accept-oral
https://proceedings.mlr.press/v235/

Publication series

NameProceedings of the International Conference on Machine Learning
NameProceedings of Machine Learning Research
Volume235
ISSN (Print)2640-3498

Conference

Conference41st International Conference on Machine Learning, ICML 2024
Country/TerritoryAustria
CityVienna
Period21/07/2427/07/24
Internet address

Scopus Subject Areas

  • Software
  • Artificial Intelligence
  • Control and Systems Engineering
  • Statistics and Probability

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