Effect of surface electronic properties of ITO on luminance efficiency of OLED

  • Furong Zhu*
  • , Hu Jian Qiao
  • , Liew Yoon Fei
  • , Kian Soo Ong
  • , Xiaotao Hao
  • *Corresponding author for this work

Research output: Chapter in book/report/conference proceedingConference proceedingpeer-review

Abstract

We report the results of an effort to understand the effect of surface electronic structure of indium tin oxide (ITO) on luminance efficiency of organic light-emitting devices (OLED)s. Nitric oxide (NO) plasma was used to modify the ITO. NO plasma induced an increase in the sheet resistance of ITO. The surface electronic structure of ITO was studied using X-ray photoelectron spectroscopy. An approximately 4-nm thick low conductivity layer with a production of N-O type species was formed near the ITO surface region. It is demonstrated that the barrier for hole-injection from an ITO anode to a hole-transporting layer can be engineered by NO plasma treatment. The increase in luminance efficiency of the OLEDs reflects an improved current balance in the device.

Original languageEnglish
Title of host publicationPhotonics: Design, Technology, and Packaging
EditorsChennupati Jagadish, Kent D. Choquette, Benjamin J. Eggleton, Brett D. Nener, Keith A. Nugent
PublisherSPIE
Pages163-173
Number of pages11
DOIs
Publication statusPublished - 25 Mar 2004
EventMicroelectronics, Mems, and Nanotechnology - Perth, WA, Australia
Duration: 10 Dec 200312 Dec 2003
https://www.spiedigitallibrary.org/conference-proceedings-of-spie/5277.toc (Conference proceedings)

Publication series

NameProceedings of SPIE - The International Society for Optical Engineering
PublisherSPIE
Volume5277
ISSN (Print)0277-786X

Conference

ConferenceMicroelectronics, Mems, and Nanotechnology
Country/TerritoryAustralia
CityPerth, WA
Period10/12/0312/12/03
Internet address

User-Defined Keywords

  • Indium tin oxide
  • Organic light emitting devices
  • XPS

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