Dummy-feature placement for chemical-mechanical polishing uniformity in a shallow-trench isolation process

Keyphrases

• Isolation Method 100%
• Chemical Mechanical Polishing 100%
• Shallow Trench Isolation 100%
• Polishing Uniformity 100%
• Dual Material 33%
• Polishing Step 33%
• Placement Problem 16%
• Iterative Approach 16%
• Manufacturability 16%
• Layout Pattern 16%
• Pattern Density 16%
• Pad Bending 16%
• Single Material 16%
• Motorola 16%
• Semi-physical Model 16%
• Dependent Relation 16%
• Nonlinear Programming Problem 16%

Engineering

• Chemical Mechanical Polishing 100%
• Shallow Trench Isolation 100%
• Polishing Step 33%
• Manufacturability 16%
• Single Material 16%
• Polish Rate 16%

Arts and Humanities

• Uniformity 100%
• Placement 100%