DSA template mask détermination and cut redistribution for advanced 1D gridded design

Zigang Xiao; Yuelin Du; Martin D.F. Wong; Hongbo Zhang

doi:10.1117/12.2025688

DSA template mask détermination and cut redistribution for advanced 1D gridded design

Zigang Xiao, Yuelin Du, Martin D.F. Wong, Hongbo Zhang

Office of the Provost

Research output: Chapter in book/report/conference proceeding › Conference proceeding › peer-review

37 Citations (Scopus)

Abstract

Directed self-assembly (DSA) technology has already demonstrated its capability for isolated and grouped contact/via pattern for 1D gridded design. If we reverse the resist tune, this technique can also be used to implement the cut printing. However, for this purpose, we need to redistribute the cuts by extending the real wires to form the desired cut distribution for template mask making. Based on this assumption, we propose an algorithm to redistribute the original cuts such that they form groups of non-conflict DSA templates. Expérimental results demonstrate that our method can effectively redistribute the cuts and improve the layout manufacturability.

Original language	English
Title of host publication	Photomask Technology 2013
Editors	Thomas B. Faure, Paul W. Ackmann
Publisher	SPIE
ISBN (Print)	9780819495457
DOIs	https://doi.org/10.1117/12.2025688
Publication status	Published - Sept 2013
Event	SPIE Conference on Photomask Technology 2013 - Monterey, United States Duration: 10 Sept 2013 → 12 Sept 2013 https://www.spiedigitallibrary.org/conference-proceedings-of-spie/8880.toc#FrontMatterVolume8880

Publication series

Name	Proceedings of SPIE - The International Society for Optical Engineering
Volume	8880
ISSN (Print)	0277-786X
ISSN (Electronic)	1996-756X

Conference

Conference	SPIE Conference on Photomask Technology 2013
Country/Territory	United States
City	Monterey
Period	10/09/13 → 12/09/13
Internet address	https://www.spiedigitallibrary.org/conference-proceedings-of-spie/8880.toc#FrontMatterVolume8880

Scopus Subject Areas

Electronic, Optical and Magnetic Materials
Condensed Matter Physics
Computer Science Applications
Applied Mathematics
Electrical and Electronic Engineering

User-Defined Keywords

algorithm
cut redistribution
Directed self-assembly
DSA
template

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10.1117/12.2025688

Cite this

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title = "DSA template mask d{\'e}termination and cut redistribution for advanced 1D gridded design",

abstract = "Directed self-assembly (DSA) technology has already demonstrated its capability for isolated and grouped contact/via pattern for 1D gridded design. If we reverse the resist tune, this technique can also be used to implement the cut printing. However, for this purpose, we need to redistribute the cuts by extending the real wires to form the desired cut distribution for template mask making. Based on this assumption, we propose an algorithm to redistribute the original cuts such that they form groups of non-conflict DSA templates. Exp{\'e}rimental results demonstrate that our method can effectively redistribute the cuts and improve the layout manufacturability.",

keywords = "algorithm, cut redistribution, Directed self-assembly, DSA, template",

author = "Zigang Xiao and Yuelin Du and Wong, {Martin D.F.} and Hongbo Zhang",

note = "Publisher Copyright: {\textcopyright} (2013) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE).; SPIE Conference on Photomask Technology 2013 ; Conference date: 10-09-2013 Through 12-09-2013",

year = "2013",

month = sep,

doi = "10.1117/12.2025688",

language = "English",

isbn = "9780819495457",

series = "Proceedings of SPIE - The International Society for Optical Engineering",

publisher = "SPIE",

editor = "Faure, {Thomas B.} and Ackmann, {Paul W.}",

booktitle = "Photomask Technology 2013",

address = "United States",

url = "https://www.spiedigitallibrary.org/conference-proceedings-of-spie/8880.toc#FrontMatterVolume8880",

}

Xiao, Z, Du, Y, Wong, MDF & Zhang, H 2013, DSA template mask détermination and cut redistribution for advanced 1D gridded design. in TB Faure & PW Ackmann (eds), Photomask Technology 2013., 888017, Proceedings of SPIE - The International Society for Optical Engineering, vol. 8880, SPIE, SPIE Conference on Photomask Technology 2013, Monterey, California, United States, 10/09/13. https://doi.org/10.1117/12.2025688

DSA template mask détermination and cut redistribution for advanced 1D gridded design. / Xiao, Zigang; Du, Yuelin; Wong, Martin D.F. et al.
Photomask Technology 2013. ed. / Thomas B. Faure; Paul W. Ackmann. SPIE, 2013. 888017 (Proceedings of SPIE - The International Society for Optical Engineering; Vol. 8880).

Research output: Chapter in book/report/conference proceeding › Conference proceeding › peer-review

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AB - Directed self-assembly (DSA) technology has already demonstrated its capability for isolated and grouped contact/via pattern for 1D gridded design. If we reverse the resist tune, this technique can also be used to implement the cut printing. However, for this purpose, we need to redistribute the cuts by extending the real wires to form the desired cut distribution for template mask making. Based on this assumption, we propose an algorithm to redistribute the original cuts such that they form groups of non-conflict DSA templates. Expérimental results demonstrate that our method can effectively redistribute the cuts and improve the layout manufacturability.

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DSA template mask détermination and cut redistribution for advanced 1D gridded design

Abstract

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Conference

Scopus Subject Areas

User-Defined Keywords

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