Density driven placement of sub-DSA resolution assistant features (SDRAFs)

Daifeng Guo; Maryann Tung; Ioannis Karageorgos; H. S. Philip Wong; Martin D. F. Wong

doi:10.1117/12.2257954

Density driven placement of sub-DSA resolution assistant features (SDRAFs)

Daifeng Guo, Maryann Tung, Ioannis Karageorgos, H. S. Philip Wong, Martin D. F. Wong

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Research output: Chapter in book/report/conference proceeding › Conference proceeding › peer-review

3 Citations (Scopus)

Abstract

In the pursuit of alternatives to traditional optical lithography, block copolymer directed self-assembly (DSA) has emerged as a low-cost, high-throughput option. However, issues of defectivity have hampered DSA's viability for large-scale patterning. Recent studies have shown copolymer fill level to be a crucial factor in defectivity, as template overfill can result in malformed DSA structures and poor LCDU after etching. For this reason, it is previously demonstrated the use of sub-DSA resolution assist features (SDRAFs) as a method of evening out template density. In this work, we propose an algorithm to place SDRAFs in random logic contact/via layouts. By adopting this SDRAF placement scheme, we can significantly improve the density unevenness and the resources used are also optimized. This is the first work to investigate the placement of SDRAFs in order to mitigate the DSA density variation problem, and it can be adopted for the mass deployment of DSA.

Original language	English
Title of host publication	Design-Process-Technology Co-optimization for Manufacturability XI
Editors	Luigi Capodieci, Jason P. Cain
Publisher	SPIE
ISBN (Electronic)	9781510607484
ISBN (Print)	9781510607477
DOIs	https://doi.org/10.1117/12.2257954
Publication status	Published - Mar 2017
Event	Design-Process-Technology Co-optimization for Manufacturability XI 2017 - San Jose, United States Duration: 1 Mar 2017 → 2 Mar 2017 https://www.spiedigitallibrary.org/conference-proceedings-of-spie/10148.toc

Publication series

Name	Proceedings of SPIE - The International Society for Optical Engineering
Volume	10148
ISSN (Print)	0277-786X
ISSN (Electronic)	1996-756X

Conference

Conference	Design-Process-Technology Co-optimization for Manufacturability XI 2017
Country/Territory	United States
City	San Jose
Period	1/03/17 → 2/03/17
Internet address	https://www.spiedigitallibrary.org/conference-proceedings-of-spie/10148.toc

Scopus Subject Areas

Electronic, Optical and Magnetic Materials
Condensed Matter Physics
Computer Science Applications
Applied Mathematics
Electrical and Electronic Engineering

User-Defined Keywords

Density
Directed self-assembly
Placement
Sub-DSA assistant features

Access to Document

10.1117/12.2257954

Cite this

Guo, D., Tung, M., Karageorgos, I., Wong, H. S. P., & Wong, M. D. F. (2017). Density driven placement of sub-DSA resolution assistant features (SDRAFs). In L. Capodieci, & J. P. Cain (Eds.), Design-Process-Technology Co-optimization for Manufacturability XI Article 101480E (Proceedings of SPIE - The International Society for Optical Engineering; Vol. 10148). SPIE. https://doi.org/10.1117/12.2257954

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title = "Density driven placement of sub-DSA resolution assistant features (SDRAFs)",

abstract = "In the pursuit of alternatives to traditional optical lithography, block copolymer directed self-assembly (DSA) has emerged as a low-cost, high-throughput option. However, issues of defectivity have hampered DSA's viability for large-scale patterning. Recent studies have shown copolymer fill level to be a crucial factor in defectivity, as template overfill can result in malformed DSA structures and poor LCDU after etching. For this reason, it is previously demonstrated the use of sub-DSA resolution assist features (SDRAFs) as a method of evening out template density. In this work, we propose an algorithm to place SDRAFs in random logic contact/via layouts. By adopting this SDRAF placement scheme, we can significantly improve the density unevenness and the resources used are also optimized. This is the first work to investigate the placement of SDRAFs in order to mitigate the DSA density variation problem, and it can be adopted for the mass deployment of DSA.",

keywords = "Density, Directed self-assembly, Placement, Sub-DSA assistant features",

author = "Daifeng Guo and Maryann Tung and Ioannis Karageorgos and Wong, {H. S. Philip} and Wong, {Martin D. F.}",

note = "Funding Information: This work was partially supported by the National Science Foundation under Grant CCF-1421563. Publisher Copyright: {\textcopyright} 2017 SPIE.; Design-Process-Technology Co-optimization for Manufacturability XI 2017 ; Conference date: 01-03-2017 Through 02-03-2017",

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Guo, D, Tung, M, Karageorgos, I, Wong, HSP & Wong, MDF 2017, Density driven placement of sub-DSA resolution assistant features (SDRAFs). in L Capodieci & JP Cain (eds), Design-Process-Technology Co-optimization for Manufacturability XI., 101480E, Proceedings of SPIE - The International Society for Optical Engineering, vol. 10148, SPIE, Design-Process-Technology Co-optimization for Manufacturability XI 2017, San Jose, California, United States, 1/03/17. https://doi.org/10.1117/12.2257954

Density driven placement of sub-DSA resolution assistant features (SDRAFs). / Guo, Daifeng; Tung, Maryann; Karageorgos, Ioannis et al.
Design-Process-Technology Co-optimization for Manufacturability XI. ed. / Luigi Capodieci; Jason P. Cain. SPIE, 2017. 101480E (Proceedings of SPIE - The International Society for Optical Engineering; Vol. 10148).

Research output: Chapter in book/report/conference proceeding › Conference proceeding › peer-review

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AU - Tung, Maryann

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AU - Wong, Martin D. F.

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N2 - In the pursuit of alternatives to traditional optical lithography, block copolymer directed self-assembly (DSA) has emerged as a low-cost, high-throughput option. However, issues of defectivity have hampered DSA's viability for large-scale patterning. Recent studies have shown copolymer fill level to be a crucial factor in defectivity, as template overfill can result in malformed DSA structures and poor LCDU after etching. For this reason, it is previously demonstrated the use of sub-DSA resolution assist features (SDRAFs) as a method of evening out template density. In this work, we propose an algorithm to place SDRAFs in random logic contact/via layouts. By adopting this SDRAF placement scheme, we can significantly improve the density unevenness and the resources used are also optimized. This is the first work to investigate the placement of SDRAFs in order to mitigate the DSA density variation problem, and it can be adopted for the mass deployment of DSA.

AB - In the pursuit of alternatives to traditional optical lithography, block copolymer directed self-assembly (DSA) has emerged as a low-cost, high-throughput option. However, issues of defectivity have hampered DSA's viability for large-scale patterning. Recent studies have shown copolymer fill level to be a crucial factor in defectivity, as template overfill can result in malformed DSA structures and poor LCDU after etching. For this reason, it is previously demonstrated the use of sub-DSA resolution assist features (SDRAFs) as a method of evening out template density. In this work, we propose an algorithm to place SDRAFs in random logic contact/via layouts. By adopting this SDRAF placement scheme, we can significantly improve the density unevenness and the resources used are also optimized. This is the first work to investigate the placement of SDRAFs in order to mitigate the DSA density variation problem, and it can be adopted for the mass deployment of DSA.

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Density driven placement of sub-DSA resolution assistant features (SDRAFs)

Abstract

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Conference

Scopus Subject Areas

User-Defined Keywords

Access to Document

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