CTM-SRAF: Continuous Transmission Mask-based Constraint-aware Sub Resolution Assist Feature Generation

Ziyang Yu; Peiyu Liao; Yuzhe Ma; Bei Yu; Martin D.F. Wong

doi:10.1109/TCAD.2023.3239559

CTM-SRAF: Continuous Transmission Mask-based Constraint-aware Sub Resolution Assist Feature Generation

Ziyang Yu^*, Peiyu Liao, Yuzhe Ma, Bei Yu, Martin D.F. Wong

^*Corresponding author for this work

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Research output: Contribution to journal › Journal article › peer-review

2 Citations (Scopus)

Abstract

In the lithography process, subresolution assist features (SRAFs), as an essential resolution enhancement technique (RET), is applied to improve the pattern fidelity and enlarge the process window. In this article, we propose a robust constraint-aware SRAF generation method based on continuous transmission mask (CTM). The intensity distribution on the CTM is extracted to guide the SRAF generation. The SRAF insertion also honors the design rules, which is formulated as integer programming with quadratic constraints and solved by a fast yet efficient algorithm. A fast probe-based SRAF evolution method is proposed to determine the shapes of SRAFs. The effectiveness and efficiency are demonstrated based on the experimental results.

Original language	English
Pages (from-to)	3402-3411
Number of pages	10
Journal	IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems
Volume	42
Issue number	10
Early online date	25 Jan 2023
DOIs	https://doi.org/10.1109/TCAD.2023.3239559
Publication status	Published - Oct 2023

Scopus Subject Areas

Software
Computer Graphics and Computer-Aided Design
Electrical and Electronic Engineering

User-Defined Keywords

Continuous transmission mask (CTM)
design for manufacturability
subresolution assist feature (SRAF) generation

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10.1109/TCAD.2023.3239559

Cite this

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title = "CTM-SRAF: Continuous Transmission Mask-based Constraint-aware Sub Resolution Assist Feature Generation",

abstract = "In the lithography process, subresolution assist features (SRAFs), as an essential resolution enhancement technique (RET), is applied to improve the pattern fidelity and enlarge the process window. In this article, we propose a robust constraint-aware SRAF generation method based on continuous transmission mask (CTM). The intensity distribution on the CTM is extracted to guide the SRAF generation. The SRAF insertion also honors the design rules, which is formulated as integer programming with quadratic constraints and solved by a fast yet efficient algorithm. A fast probe-based SRAF evolution method is proposed to determine the shapes of SRAFs. The effectiveness and efficiency are demonstrated based on the experimental results.",

keywords = "Continuous transmission mask (CTM), design for manufacturability, subresolution assist feature (SRAF) generation",

author = "Ziyang Yu and Peiyu Liao and Yuzhe Ma and Bei Yu and Wong, {Martin D.F.}",

note = "Funding Information: This work was supported in part by the Research Grants Council of Hong Kong, SAR, under Project CUHK14208021. This article was recommended by Associate Editor L. Behjat Publisher Copyright: {\textcopyright} 2023 IEEE.",

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language = "English",

volume = "42",

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journal = "IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems",

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T1 - CTM-SRAF

T2 - Continuous Transmission Mask-based Constraint-aware Sub Resolution Assist Feature Generation

AU - Yu, Ziyang

AU - Liao, Peiyu

AU - Ma, Yuzhe

AU - Yu, Bei

AU - Wong, Martin D.F.

N1 - Funding Information: This work was supported in part by the Research Grants Council of Hong Kong, SAR, under Project CUHK14208021. This article was recommended by Associate Editor L. Behjat Publisher Copyright: © 2023 IEEE.

PY - 2023/10

Y1 - 2023/10

N2 - In the lithography process, subresolution assist features (SRAFs), as an essential resolution enhancement technique (RET), is applied to improve the pattern fidelity and enlarge the process window. In this article, we propose a robust constraint-aware SRAF generation method based on continuous transmission mask (CTM). The intensity distribution on the CTM is extracted to guide the SRAF generation. The SRAF insertion also honors the design rules, which is formulated as integer programming with quadratic constraints and solved by a fast yet efficient algorithm. A fast probe-based SRAF evolution method is proposed to determine the shapes of SRAFs. The effectiveness and efficiency are demonstrated based on the experimental results.

AB - In the lithography process, subresolution assist features (SRAFs), as an essential resolution enhancement technique (RET), is applied to improve the pattern fidelity and enlarge the process window. In this article, we propose a robust constraint-aware SRAF generation method based on continuous transmission mask (CTM). The intensity distribution on the CTM is extracted to guide the SRAF generation. The SRAF insertion also honors the design rules, which is formulated as integer programming with quadratic constraints and solved by a fast yet efficient algorithm. A fast probe-based SRAF evolution method is proposed to determine the shapes of SRAFs. The effectiveness and efficiency are demonstrated based on the experimental results.

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KW - design for manufacturability

KW - subresolution assist feature (SRAF) generation

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DO - 10.1109/TCAD.2023.3239559

M3 - Journal article

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JO - IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems

JF - IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems

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CTM-SRAF: Continuous Transmission Mask-based Constraint-aware Sub Resolution Assist Feature Generation

Abstract

Scopus Subject Areas

User-Defined Keywords

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