Contact layer decomposition to enable DSA with multi-patterning technique for standard cell based layout

Zigang Xiao, Chun-Xun Lin, Martin D.F. Wong, Hongbo Zhang

Research output: Chapter in book/report/conference proceedingConference proceedingpeer-review

25 Citations (Scopus)

Abstract

Multiple patterning lithography has been widely adopted for today's circuit manufacturing. However, increasing the number of masks will make the manufacturing process more expensive. More importantly, towards 7 nm technology node, the accumulated overlay in multiple patterning will cause unacceptable edge placement error (EPE). Recently, directed self-assembly (DSA) has been shown to be an effective lithography technology that can pattern contact/via/cuts with high throughput and low cost. DSA is currently aiming at 7 nm technology, where the guiding template generation needs either double patterning EUV or multiple patterning DUV process. By incorporating DSA into the multiple patterning process, it is possible to reduce the number of masks and achieve a cost effective solution. In this paper, we study the decomposition problem for contact layer in row-based standard cell layout with DSA-MP complementary lithography. We explore several heuristic-based approaches, and propose an algorithm that decomposes a standard cell row optimally in polynomial-time. Our experiments show that our algorithm guarantees to find a minimum cost solution if one exists, while the heuristic cannot or only finds a sub-optimal solution. Our results show that the DSA-MP complementary approach is very promising for the future advanced nodes.
Original languageEnglish
Title of host publication2016 21st Asia and South Pacific Design Automation Conference (ASP-DAC)
PublisherIEEE Canada
Pages95-102
Number of pages8
ISBN (Print)9781467395687
DOIs
Publication statusPublished - Jan 2016
Event21st Asia and South Pacific Design Automation Conference, ASP-DAC 2016 - Holiday Inn Macao Cotai Central, Macao, China
Duration: 25 Jan 201628 Jan 2016
https://www.aspdac.com/aspdac2016/ (Link to conference website)
https://ieeexplore.ieee.org/xpl/conhome/7422345/proceeding (Link to conference proceedings)

Publication series

NameProceedings of Asia and South Pacific Design Automation Conference

Conference

Conference21st Asia and South Pacific Design Automation Conference, ASP-DAC 2016
Country/TerritoryChina
CityMacao
Period25/01/1628/01/16
Internet address

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