Computer Simulation of Nucleation on (001) Kossel Crystal Surface

Eric C. M. Tang; Tong B. Tang

doi:10.1080/00150199308237879

Computer Simulation of Nucleation on (001) Kossel Crystal Surface

Eric C. M. Tang, Tong B. Tang

Research output: Contribution to journal › Journal article › peer-review

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Abstract

The Monte Carlo technique has been applied to nucleation-controlled growth of a (001) Kossel crystal surface with surface diffusion. Average diffusion step d and jump frequency v_sd of an atom have been obtained. We find that d depends on the temperature of the surface and the driving force for the growth. At low temperature, v_sdincreases with the driving force, but the reverse holds at high temperature. The change in slope is related to the topological state of the surface.

Original language	English
Pages (from-to)	9-12
Number of pages	4
Journal	Ferroelectrics
Volume	142
Issue number	1
DOIs	https://doi.org/10.1080/00150199308237879
Publication status	Published - 1 Jan 1993
Externally published	Yes

Scopus Subject Areas

Electronic, Optical and Magnetic Materials
Condensed Matter Physics

User-Defined Keywords

kinetic roughening
Monte Carlo simulation
surface diffusion

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10.1080/00150199308237879

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abstract = "The Monte Carlo technique has been applied to nucleation-controlled growth of a (001) Kossel crystal surface with surface diffusion. Average diffusion step d and jump frequency vsd of an atom have been obtained. We find that d depends on the temperature of the surface and the driving force for the growth. At low temperature, vsdincreases with the driving force, but the reverse holds at high temperature. The change in slope is related to the topological state of the surface.",

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N2 - The Monte Carlo technique has been applied to nucleation-controlled growth of a (001) Kossel crystal surface with surface diffusion. Average diffusion step d and jump frequency vsd of an atom have been obtained. We find that d depends on the temperature of the surface and the driving force for the growth. At low temperature, vsdincreases with the driving force, but the reverse holds at high temperature. The change in slope is related to the topological state of the surface.

AB - The Monte Carlo technique has been applied to nucleation-controlled growth of a (001) Kossel crystal surface with surface diffusion. Average diffusion step d and jump frequency vsd of an atom have been obtained. We find that d depends on the temperature of the surface and the driving force for the growth. At low temperature, vsdincreases with the driving force, but the reverse holds at high temperature. The change in slope is related to the topological state of the surface.

KW - kinetic roughening

KW - Monte Carlo simulation

KW - surface diffusion

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DO - 10.1080/00150199308237879

M3 - Journal article

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Computer Simulation of Nucleation on (001) Kossel Crystal Surface

Abstract

Scopus Subject Areas

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