Characterization and decomposition of self-aligned quadruple patterning friendly layout

Hongbo Zhang; Yuelin Du; Martin D.F. Wong; Rasit O. Topaloglu

doi:10.1117/12.918078

Characterization and decomposition of self-aligned quadruple patterning friendly layout

Hongbo Zhang^*, Yuelin Du, Martin D.F. Wong, Rasit O. Topaloglu

^*Corresponding author for this work

Office of the Provost

Research output: Chapter in book/report/conference proceeding › Conference proceeding › peer-review

18 Citations (Scopus)

Abstract

Self-aligned quadruple patterning (SAQP) lithography is one of the major techniques for the future process requirement after 16nm/14nm technology node. In this paper, based on the existing knowledge of current 193nm lithography and process flow of SAQP, we will process an early study on the definition of SAQP-friendly layout. With the exploration of the feasible feature regions and possible combinations of adjacent features, we define several simple but important geometry rules to help define the SAQP-friendliness. We also introduce a conflicting graph algorithm to generate the feature region assignment for SAQP decomposition. Our experimental results validate our SAQP-friendly layout definition, and basic circuit building blocks in the low level metal layer are analyzed.

Original language	English
Title of host publication	Optical Microlithography XXV
Editors	Will Conley
Publisher	SPIE
ISBN (Print)	9780819489821
DOIs	https://doi.org/10.1117/12.918078
Publication status	Published - Feb 2012
Event	Optical Microlithography XXV - San Jose, United States Duration: 13 Feb 2012 → 16 Feb 2012 https://www.spiedigitallibrary.org/conference-proceedings-of-spie/8326.toc#FrontMatterVolume8326

Publication series

Name	Proceedings of SPIE - The International Society for Optical Engineering
Volume	8326
ISSN (Print)	0277-786X

Conference

Conference	Optical Microlithography XXV
Country/Territory	United States
City	San Jose
Period	13/02/12 → 16/02/12
Internet address	https://www.spiedigitallibrary.org/conference-proceedings-of-spie/8326.toc#FrontMatterVolume8326

Scopus Subject Areas

Electronic, Optical and Magnetic Materials
Condensed Matter Physics
Computer Science Applications
Applied Mathematics
Electrical and Electronic Engineering

User-Defined Keywords

Characterization
Conflicting Graph
Decomposition
Feature-Region Assignment
SAQP
Self-Aligned Quadruple Patterning

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10.1117/12.918078

Cite this

@inproceedings{99e602284e3f42d3b943922a8dd5c759,

title = "Characterization and decomposition of self-aligned quadruple patterning friendly layout",

abstract = "Self-aligned quadruple patterning (SAQP) lithography is one of the major techniques for the future process requirement after 16nm/14nm technology node. In this paper, based on the existing knowledge of current 193nm lithography and process flow of SAQP, we will process an early study on the definition of SAQP-friendly layout. With the exploration of the feasible feature regions and possible combinations of adjacent features, we define several simple but important geometry rules to help define the SAQP-friendliness. We also introduce a conflicting graph algorithm to generate the feature region assignment for SAQP decomposition. Our experimental results validate our SAQP-friendly layout definition, and basic circuit building blocks in the low level metal layer are analyzed.",

keywords = "Characterization, Conflicting Graph, Decomposition, Feature-Region Assignment, SAQP, Self-Aligned Quadruple Patterning",

author = "Hongbo Zhang and Yuelin Du and Wong, {Martin D.F.} and Topaloglu, {Rasit O.}",

year = "2012",

month = feb,

doi = "10.1117/12.918078",

language = "English",

isbn = "9780819489821",

series = "Proceedings of SPIE - The International Society for Optical Engineering",

publisher = "SPIE",

editor = "{Conley }, Will",

booktitle = "Optical Microlithography XXV",

address = "United States",

note = "Optical Microlithography XXV ; Conference date: 13-02-2012 Through 16-02-2012",

url = "https://www.spiedigitallibrary.org/conference-proceedings-of-spie/8326.toc#FrontMatterVolume8326",

}

Zhang, H, Du, Y, Wong, MDF & Topaloglu, RO 2012, Characterization and decomposition of self-aligned quadruple patterning friendly layout. in W Conley (ed.), Optical Microlithography XXV., 83260F, Proceedings of SPIE - The International Society for Optical Engineering, vol. 8326, SPIE, Optical Microlithography XXV, San Jose, California, United States, 13/02/12. https://doi.org/10.1117/12.918078

Characterization and decomposition of self-aligned quadruple patterning friendly layout. / Zhang, Hongbo; Du, Yuelin; Wong, Martin D.F. et al.
Optical Microlithography XXV. ed. / Will Conley . SPIE, 2012. 83260F (Proceedings of SPIE - The International Society for Optical Engineering; Vol. 8326).

Research output: Chapter in book/report/conference proceeding › Conference proceeding › peer-review

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T1 - Characterization and decomposition of self-aligned quadruple patterning friendly layout

AU - Zhang, Hongbo

AU - Du, Yuelin

AU - Wong, Martin D.F.

AU - Topaloglu, Rasit O.

PY - 2012/2

Y1 - 2012/2

N2 - Self-aligned quadruple patterning (SAQP) lithography is one of the major techniques for the future process requirement after 16nm/14nm technology node. In this paper, based on the existing knowledge of current 193nm lithography and process flow of SAQP, we will process an early study on the definition of SAQP-friendly layout. With the exploration of the feasible feature regions and possible combinations of adjacent features, we define several simple but important geometry rules to help define the SAQP-friendliness. We also introduce a conflicting graph algorithm to generate the feature region assignment for SAQP decomposition. Our experimental results validate our SAQP-friendly layout definition, and basic circuit building blocks in the low level metal layer are analyzed.

AB - Self-aligned quadruple patterning (SAQP) lithography is one of the major techniques for the future process requirement after 16nm/14nm technology node. In this paper, based on the existing knowledge of current 193nm lithography and process flow of SAQP, we will process an early study on the definition of SAQP-friendly layout. With the exploration of the feasible feature regions and possible combinations of adjacent features, we define several simple but important geometry rules to help define the SAQP-friendliness. We also introduce a conflicting graph algorithm to generate the feature region assignment for SAQP decomposition. Our experimental results validate our SAQP-friendly layout definition, and basic circuit building blocks in the low level metal layer are analyzed.

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KW - Conflicting Graph

KW - Decomposition

KW - Feature-Region Assignment

KW - SAQP

KW - Self-Aligned Quadruple Patterning

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T3 - Proceedings of SPIE - The International Society for Optical Engineering

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ER -

Characterization and decomposition of self-aligned quadruple patterning friendly layout

Abstract

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Conference

Scopus Subject Areas

User-Defined Keywords

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