Atomic layer deposition assisted non-destructive strategy for cleaning Ag dendrites based SERS substrates

Xinxin Wang, Lin Zhu, Tangjie Cheng, Jisong Qian, Qing Wang, Qianqian Ding, Aidong Li*, Liyong Jiang*, Yanqiang Cao*

*Corresponding author for this work

Research output: Contribution to journalJournal articlepeer-review

2 Citations (Scopus)

Abstract

Ag dendrites have recently been widely reported due to their excellent surface-enhanced Raman scattering (SERS) properties. However, prepared pristine Ag dendrites are usually contaminated by organic impurities, which has a huge negative impact on their Raman detection and greatly limits their practical applications. In this paper, we reported a facile strategy to obtain clean Ag dendrites by high temperature decomposition of organic impurities. With the assistance of ultra-thin coating via atomic layer deposition (ALD), the nanostructure of Ag dendrites can be retained at high temperature. SERS activity can be recovered after etching ALD coating. Chemical composition tests indicate that the organic impurities can be effectively removed. As a result, the clean Ag dendrites can obtain more clearly discernible Raman peaks and lower limits of detection than the pristine Ag dendrites. Furthermore, it was demonstrated that this strategy is also applicable to clean other substrates, such as gold nanoparticles. Therefore, high temperature annealing with the help of ALD sacrifice coating is a promising and non-destructive strategy to clean the SERS substrates.

Original languageEnglish
Article number124502
JournalTalanta
Volume259
Early online dateApr 2023
DOIs
Publication statusPublished - 1 Jul 2023

Scopus Subject Areas

  • Analytical Chemistry

User-Defined Keywords

  • Ag dendrites
  • Atomic layer deposition
  • High temperature annealing
  • Impurity removal
  • SERS

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