Angular-dependent photoemission studies of indium tin oxide surfaces

W. Song; S. K. So; L. Cao

doi:10.1007/s003390000534

Angular-dependent photoemission studies of indium tin oxide surfaces

W. Song, S. K. So^*, L. Cao

^*Corresponding author for this work

Department of Physics

Research output: Contribution to journal › Journal article › peer-review

57 Citations (Scopus)

Abstract

Indium tin oxide (ITO) surfaces were treated by solvent cleaning, by plasma of oxygen, argon, nitrogen and by argon ion (Ar⁺) sputtering. Angular-dependent X-ray photoelectron spectroscopy (ADXPS) and ultraviolet photoelectron spectroscopy (UPS) were used to determine the chemical composition, the chemical states and the work function after each treatment. It was found that oxygen plasma and nitrogen plasma chemically reacted with the ITO surfaces. Yet little etching of the surface can be observed after plasma treatments. Among all treatments, oxygen-plasma-treated ITO achieved the highest work function of 4.40 eV, whereas Ar⁺-sputtered ITO surface had the lowest work function of 3.90 eV. The stoichiometry of the ITO surface is shown to be the major controlling factor of the ITO work function.

Original language	English
Pages (from-to)	361-365
Number of pages	5
Journal	Applied Physics A: Materials Science and Processing
Volume	72
Issue number	3
DOIs	https://doi.org/10.1007/s003390000534
Publication status	Published - Mar 2001

Scopus Subject Areas

General Chemistry
General Materials Science

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title = "Angular-dependent photoemission studies of indium tin oxide surfaces",

abstract = "Indium tin oxide (ITO) surfaces were treated by solvent cleaning, by plasma of oxygen, argon, nitrogen and by argon ion (Ar+) sputtering. Angular-dependent X-ray photoelectron spectroscopy (ADXPS) and ultraviolet photoelectron spectroscopy (UPS) were used to determine the chemical composition, the chemical states and the work function after each treatment. It was found that oxygen plasma and nitrogen plasma chemically reacted with the ITO surfaces. Yet little etching of the surface can be observed after plasma treatments. Among all treatments, oxygen-plasma-treated ITO achieved the highest work function of 4.40 eV, whereas Ar+-sputtered ITO surface had the lowest work function of 3.90 eV. The stoichiometry of the ITO surface is shown to be the major controlling factor of the ITO work function.",

author = "W. Song and So, {S. K.} and L. Cao",

note = "Support of this research by the Research Committee of Hong Kong Baptist University under Grant FRG/98-99/II-71 is gratefully acknowledged. ",

year = "2001",

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doi = "10.1007/s003390000534",

language = "English",

volume = "72",

pages = "361--365",

journal = "Applied Physics A: Materials Science and Processing",

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}

TY - JOUR

T1 - Angular-dependent photoemission studies of indium tin oxide surfaces

AU - Song, W.

AU - So, S. K.

AU - Cao, L.

N1 - Support of this research by the Research Committee of Hong Kong Baptist University under Grant FRG/98-99/II-71 is gratefully acknowledged.

PY - 2001/3

Y1 - 2001/3

N2 - Indium tin oxide (ITO) surfaces were treated by solvent cleaning, by plasma of oxygen, argon, nitrogen and by argon ion (Ar+) sputtering. Angular-dependent X-ray photoelectron spectroscopy (ADXPS) and ultraviolet photoelectron spectroscopy (UPS) were used to determine the chemical composition, the chemical states and the work function after each treatment. It was found that oxygen plasma and nitrogen plasma chemically reacted with the ITO surfaces. Yet little etching of the surface can be observed after plasma treatments. Among all treatments, oxygen-plasma-treated ITO achieved the highest work function of 4.40 eV, whereas Ar+-sputtered ITO surface had the lowest work function of 3.90 eV. The stoichiometry of the ITO surface is shown to be the major controlling factor of the ITO work function.

AB - Indium tin oxide (ITO) surfaces were treated by solvent cleaning, by plasma of oxygen, argon, nitrogen and by argon ion (Ar+) sputtering. Angular-dependent X-ray photoelectron spectroscopy (ADXPS) and ultraviolet photoelectron spectroscopy (UPS) were used to determine the chemical composition, the chemical states and the work function after each treatment. It was found that oxygen plasma and nitrogen plasma chemically reacted with the ITO surfaces. Yet little etching of the surface can be observed after plasma treatments. Among all treatments, oxygen-plasma-treated ITO achieved the highest work function of 4.40 eV, whereas Ar+-sputtered ITO surface had the lowest work function of 3.90 eV. The stoichiometry of the ITO surface is shown to be the major controlling factor of the ITO work function.

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DO - 10.1007/s003390000534

M3 - Journal article

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JO - Applied Physics A: Materials Science and Processing

JF - Applied Physics A: Materials Science and Processing

IS - 3

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Angular-dependent photoemission studies of indium tin oxide surfaces

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