Abstract
The surface properties of indium-tin-oxide (ITO) thin films treated by UV ozone or plasma were analyzed by angular dependent X-ray photoelectron spectroscopy (ADXPS) and by ultraviolet photoemission (UPS). The chemical composition, chemical states and the work function of the ITO surfaces were deduced. Our analysis indicate that ITO surface is Sn-rich. Both UV ozone and O-plasma treatments are most effective in removing surface hydrocarbon. Among all treatments, O-plasma treated surface achieved the highest work function of 4.4eV, whereas argon ion sputtered surface had the lowest work function of 3.9eV. Both O-plasma and UV ozone treatments increase the surface oxygen concentration. It is proposed that O2- ions diffuse into ITO. The diffusion length is about 50Å as deduced from ADXPS. The stoichiometry of the surface is the major factor in controlling the surface work function of ITO. A surface band bending model is proposed to account for the change of work function due to "oxidized""ITO surface after UV-ozone or oxygen plasma treatments.
| Original language | English |
|---|---|
| Pages (from-to) | 213-219 |
| Number of pages | 7 |
| Journal | Materials Research Society Symposium Proceedings |
| Volume | 747 |
| Publication status | Published - 2003 |
| Event | Crystalline Oxide-Silicon Heterostructures and Oxide Optoelectronics - Boston, MA, United States Duration: 2 Dec 2002 → 4 Dec 2002 |
Scopus Subject Areas
- General Materials Science
- Condensed Matter Physics
- Mechanics of Materials
- Mechanical Engineering