A2-ILT: GPU Accelerated ILT with Spatial Attention Mechanism

Qijing Wang, Bentian Jiang, Martin D. F. Wong, Evangeline F. Y. Young

Research output: Chapter in book/report/conference proceedingConference proceedingpeer-review

8 Citations (Scopus)

Abstract

Inverse lithography technology (ILT) is one of the promising resolution enhancement techniques (RETs) in modern design-for-manufacturing closure, however, it suffers from huge computational overhead and unaffordable mask writing time. In this paper, we propose A2-ILT, a GPU-accelerated ILT framework with spatial attention mechanism. Based on the previous GPU-accelerated ILT flow, we significantly improve the ILT quality by introducing spatial attention map and on-the-fly mask rectilinearization, and strengthen the robustness by Reinforcement-Learning deployment. Experimental results show that, comparing to the state-of-the-art solutions, A2-ILT achieves 5.06% and 11.60% reduction in printing error and process variation band with a lower mask complexity and superior runtime performance.

Original languageEnglish
Title of host publication59th ACM/IEEE Design Automation Conference - Proceedings 2022
PublisherAssociation for Computing Machinery (ACM)
Pages967-972
Number of pages6
ISBN (Print)9781450391429
DOIs
Publication statusPublished - 14 Jul 2022
Event59th ACM/IEEE Design Automation Conference, DAC 2022 - San Francisco, United States
Duration: 10 Jul 202214 Jul 2022
https://www.dac.com/About/Conference-Archive/59th-DAC-2022 (Conference website)
https://www.dac.com/Portals/0/DAC%2059/59DAC%20Onsite%20Guide_v3.pdf?ver=GbBS5sBuhmEVJWVEz9CNIg%3d%3d (Conference programme)
https://dl.acm.org/doi/proceedings/10.1145/3489517 (Conference proceedings)

Publication series

NameACM/IEEE Design Automation Conference - Proceedings
ISSN (Print)0738-100X

Conference

Conference59th ACM/IEEE Design Automation Conference, DAC 2022
Country/TerritoryUnited States
CitySan Francisco
Period10/07/2214/07/22
Internet address

Scopus Subject Areas

  • Computer Science Applications
  • Control and Systems Engineering
  • Electrical and Electronic Engineering
  • Modelling and Simulation

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