A Robust Computational Algorithm for Inverse Photomask Synthesis in Optical Projection Lithography

Siu Kai Choy, Ningning Jia, Chong Sze TONG, Man Lai TANG, Edmund Y. Lam

Research output: Contribution to journalArticlepeer-review

13 Citations (Scopus)

Abstract

Inverse lithography technology formulates the photomask synthesis as an inverse mathematical problem. To solve this, we propose a variational functional and develop a robust computational algorithm, where the proposed functional takes into account the process variations and incorporates several regularization terms that can control the mask complexity. We establish the existence of the minimizer of the functional, and in order to optimize it effectively, we adopt an alternating minimization procedure with Chambolle's fast duality projection algorithm. Experimental results show that our proposed algorithm is effective in synthesizing high quality photomasks as compared with existing methods.

Original languageEnglish
Pages (from-to)625-651
Number of pages27
JournalSIAM Journal on Imaging Sciences
Volume5
Issue number2
DOIs
Publication statusPublished - 2012

Scopus Subject Areas

  • Mathematics(all)
  • Applied Mathematics

User-Defined Keywords

  • Image synthesis
  • Inverse lithography
  • Total variation

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