Abstract
We show a link between the two apparently unrelated areas of uniformity and minimum aberration. With reference to regular fractions of two-level factorials, we derive an expression for the centred L2-discrepancy measure for uniformity in terms of the word-length pattern. This result indicates, in particular, excellent behaviour of minimum aberration designs with regard to uniformity and provides further justification for the popular criterion of minimum aberration.
| Original language | English |
|---|---|
| Pages (from-to) | 193-198 |
| Number of pages | 6 |
| Journal | Biometrika |
| Volume | 87 |
| Issue number | 1 |
| DOIs | |
| Publication status | Published - 1 Mar 2000 |
| Externally published | Yes |
User-Defined Keywords
- Centred L2-discrepancy
- Fractional factorial design
- Minimum aberration
- Uniformity
- Word-length pattern
Fingerprint
Dive into the research topics of 'A connection between uniformity and aberration in regular fractions of two-level factorials'. Together they form a unique fingerprint.Cite this
- APA
- Author
- BIBTEX
- Harvard
- Standard
- RIS
- Vancouver